SCHEMBL9851132

SCHEMBL9851132

Nc1ccc(-c2cccc(C(=O)O)c2)c(N)c1C(=O)O

nearest known ligand 0.51

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KMO O15229 2/20 0.50
FOLH1 Q04609 2/20 0.49
RXRA P19793 2/20 0.45
RXRB P28702 2/20 0.45
AKR1C3 P42330 2/20 0.45
AKR1C2 P52895 2/20 0.45
DDT P30046 1/20 0.44
TDP2 O95551 1/20 0.44
PDK2 Q15119 1/20 0.43
KEAP1 Q14145 1/20 0.43
PLA2G2A P14555 1/20 0.43
MAP4K4 O95819 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29464078 1.00 KMO (0.50) KMOFOLH1RXRARXRBAKR1C3
SCHEMBL28337326 0.91 FOLH1 (0.52) KMOFOLH1RXRARXRBAKR1C3
SCHEMBL28965508 0.83 ALDH1A1 (0.43) FOLH1MAP4K4
SCHEMBL28352021 0.80 TP53 (0.43) FOLH1RXRAMAP4K4
SCHEMBL28337319 0.79 FOLH1 (0.55) KMOFOLH1RXRARXRBAKR1C3
SCHEMBL6572577 0.78 KMO (0.53) KMOFOLH1RXRARXRBAKR1C3
SCHEMBL11107709 0.78 DDT (0.54) KMOFOLH1RXRARXRBDDT
SCHEMBL1618629 0.77 KMO (0.61) KMOFOLH1RXRARXRBDDT
SCHEMBL16749639 0.75 KMO (0.69) KMOFOLH1RXRARXRBAKR1C3
SCHEMBL29386545 0.75 KMO (0.69) KMOFOLH1RXRARXRBAKR1C3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114380964-B Ternary covalent organic framework material and application thereof in ratio pH fluorescence sensing 山东师范大学 2024-04-05 CN claimed
CN-114380964-A Ternary covalent organic framework material and application thereof in ratio pH fluorescence sensing 山东师范大学 2022-04-22 CN claimed
CN-111072962-A Synthesis and application of photosensitive polyimide for high-temperature-resistant optical fiber coating 上海维凯光电新材料有限公司 2020-04-28 CN claimed
CN-118318191-A Composition for forming wavelength conversion film 日产化学株式会社 2024-07-09 CN disclosed
CN-118192168-A Photosensitive resin composition 日产化学株式会社 2024-06-14 CN disclosed
CN-118126325-A Low-temperature-cured alkali-soluble photosensitive resin and preparation method thereof 深圳先进电子材料国际创新研究院 2024-06-04 CN disclosed
CN-114174422-B Resin composition and use thereof DIC株式会社 2024-04-30 CN disclosed
CN-114380964-B Ternary covalent organic framework material and application thereof in ratio pH fluorescence sensing 山东师范大学 2024-04-05 CN disclosed
CN-110537146-B Photosensitive resin composition 日产化学株式会社 2024-03-15 CN disclosed
CN-110537147-B Photosensitive resin composition 日产化学株式会社 2024-03-12 CN disclosed
CN-110573963-B Photosensitive resin composition 日产化学株式会社 2023-10-24 CN disclosed
CN-106479519-B Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal element, and methods for producing them JSR株式会社 2021-03-30 CN disclosed
CN-111684358-A Photosensitive resin composition 日产化学株式会社 2020-09-18 CN disclosed
CN-111072962-A Synthesis and application of photosensitive polyimide for high-temperature-resistant optical fiber coating 上海维凯光电新材料有限公司 2020-04-28 CN disclosed
CN-105567259-B Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal display element, and polymer JSR株式会社 2020-03-13 CN disclosed
CN-105733611-B Liquid crystal aligning agent, method for producing liquid crystal element, liquid crystal alignment film, and liquid crystal element JSR株式会社 2020-03-13 CN disclosed
CN-105001881-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element JSR株式会社 2020-01-31 CN disclosed
CN-110573963-A Photosensitive resin composition 日产化学株式会社 2019-12-13 CN disclosed
CN-102361678-A Method for separating acid gases using metal-organic frameworks impregnated with amines BASF SE 2012-02-22 CN disclosed
EP-0424940-A2 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES LTD. (JP) 1991-05-02 EP disclosed