SCHEMBL985818

SCHEMBL985818

C=C(CCCCCOCC1CO1)C(=O)O

nearest known ligand 0.56

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.56
ALDH1A1 P00352 4/20 0.51
TDP1 Q9NUW8 1/20 0.51
SMN1; SMN2 Q16637 1/20 0.46
MGLL Q99685 2/20 0.36
TP53 P04637 1/20 0.36
CYP3A4 P08684 1/20 0.36
TBXAS1 P24557 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17063040 1.00 TSHR (0.56) TSHRALDH1A1TDP1SMN1; SMN2MGLL
SCHEMBL984292 0.98 TSHR (0.58) TSHRALDH1A1TDP1SMN1; SMN2MGLL
SCHEMBL985178 0.94 TSHR (0.55) TSHRALDH1A1TDP1SMN1; SMN2MGLL
SCHEMBL15949765 0.91 TSHR (0.52) TSHRALDH1A1TDP1SMN1; SMN2MGLL
SCHEMBL3611978 0.87 TSHR (0.48) TSHRALDH1A1TDP1SMN1; SMN2MGLL
SCHEMBL27729061 0.86 TSHR (0.55) TSHRALDH1A1TDP1SMN1; SMN2MGLL
SCHEMBL16319601 0.86 ALDH1A1 (0.38) TSHRALDH1A1TDP1SMN1; SMN2MGLL
SCHEMBL29573866 0.84 TSHR (0.56) TSHRALDH1A1TDP1SMN1; SMN2MGLL
SCHEMBL1307986 0.84 ALDH1A1 (0.39) TSHRALDH1A1TDP1SMN1; SMN2MGLL
Methacrylic Acid SCHEMBL925395 0.84 TSHR (0.60) TSHRALDH1A1TDP1SMN1; SMN2TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5776376-A BLEND OF EPOXY AND UNSATURATED ESTER MONOMERS TOKUYAMA CORPORATION (JP) 1998-07-07 US claimed
EP-0559439-B1 Photochromic composition TOKUYAMA CORP (JP) 1997-06-04 EP claimed
US-11685145-B2 Flow path structure, liquid ejecting apparatus, liquid ejecting head, and method of manufacturing flow path structure SEIKO EPSON CORPORATION (JP) 2023-06-27 US disclosed
US-11338562-B2 Antifogging laminate MITSUI CHEMICALS, INC. (JP) 2022-05-24 US disclosed
US-20210284862-A1 Antireflective Laminate MITSUI CHEMICALS, INC. (JP) 2021-09-16 US disclosed
US-10559777-B2 Radiation curable composition for water scavenging layer, and method of manufacturing the same BASF COATINGS GMBH (DE) 2020-02-11 US disclosed
US-20190202184-A1 ANTIFOGGING LAMINATE MITSUI CHEMICALS, INC. (JP) 2019-07-04 US disclosed
EP-3505345-A1 ANTIREFLECTIVE LAMINATE Mitsui Chemicals, Inc. (JP) 2019-07-03 EP disclosed
EP-3505344-A1 ANTIFOG LAMINATE Mitsui Chemicals, Inc. (JP) 2019-07-03 EP disclosed
EP-3176216-B1 HYDROPHILIC MATERIAL COMPRISING SULFONATE COPOLYMER AND AMINO RESIN MITSUI CHEMICALS INC (JP) 2019-04-24 EP disclosed
EP-3398975-A1 PHOTOSENSITIVE COMPOSITION San-Apro Limited (JP) 2018-11-07 EP disclosed
US-20060194029-A1 Ink composition, inkjet recording method using the same, and printed material FUJI PHOTO FILM CO., LTD. 2006-08-31 US disclosed
EP-0926146-B1 CHROMENE COMPOUNDS TOKUYAMA CORP (JP) 2003-02-12 EP disclosed
US-6197225-B1 PHOTOCHROMIC LENS MADE OF A POLYMER OF A PHOTOCHROMIC POLYMERIZABLE COMPOSITION TOKUYAMA CORPORATION (JP) 2001-03-06 US disclosed
EP-0926146-A1 CHROMENE COMPOUNDS TOKUYAMA CORPORATION (JP) 1999-06-30 EP disclosed
EP-0559439-B1 Photochromic composition TOKUYAMA CORP (JP) 1997-06-04 EP disclosed
US-5462698-A Lenses TOKUYAMA CORPORATION (JP) 1995-10-31 US disclosed
US-5395566-A Addition polymerizable composition, epoxy monomer, imide or anhydride containing fused ring photochromic compound, lenses TOKUYAMA CORPORATION (JP) 1995-03-07 US disclosed
EP-0619358-A1 Photochromic composition TOKUYAMA CORPORATION (JP) 1994-10-12 EP disclosed
EP-0559439-A2 Photochromic composition TOKUYAMA CORPORATION (JP) 1993-09-08 EP disclosed