Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.52 |
| ▸ | TSHR | P16473 | 6/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 5/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.42 |
| ▸ | TP53 | P04637 | 2/20 | 0.42 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.42 |
| ▸ | CHKA | P35790 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 5/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.38 |
| ▸ | CYP2A13 | Q16696 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | HBB | P68871 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL1884245 | 0.98 | ALDH1A1 (0.55) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL7023406 | 0.95 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL7023410 | 0.95 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL10934676 | 0.95 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| SCHEMBL167901 | 0.95 | ALDH1A1 (0.58) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL9859581 | 0.93 | ALDH1A1 (0.50) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| SCHEMBL10932536 | 0.93 | ALDH1A1 (0.55) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrogen Sulfide SCHEMBL27551222 | 0.91 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL10975472 | 0.91 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Zinc Chloride SCHEMBL10975468 | 0.89 | ALDH1A1 (0.46) | ALDH1A1TSHRALOX15HSD17B10MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4510226-A | Photosensitive composition and pattern forming process using same | HITACHI, LTD. (JP) | 1985-04-09 | — | — | US | claimed |
| EP-0042704-B1 | METHOD OF FORMING A PATTERN EMPLOYING A PHOTOSENSITIVE COMPOSITION | Hitachi, Ltd. (JP) | 1985-03-20 | — | — | EP | claimed |
| US-4377630-A | COMPRISING AN AROMATIC DIAZONIUM SALT AND N,N-DIALKYL ANILINE SALT | HITACHI, LTD. (JP) | 1983-03-22 | — | — | US | claimed |
| EP-0042704-A2 | Method of forming a pattern employing a photosensitive composition | Hitachi, Ltd. (JP) | 1981-12-30 | — | — | EP | claimed |
| JP-58068742-A | — | — | None | — | — | JP | disclosed |
| JP-57072140-A | — | — | None | — | — | JP | disclosed |
| JP-57191632-A | — | — | None | — | — | JP | disclosed |
| US-4983500-A | Resolution, contrast | HITACHI, LTD. (JP) | 1991-01-08 | — | — | US | disclosed |
| EP-0100920-B1 | PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING PROCESS USING SAME | HITACHI, LTD. (JP) | 1986-07-16 | — | — | EP | disclosed |
| US-4579804-A | HYDROPHILIC BINDER CONTAINING METAL DEVELOPING NUCLEI, AND OIL-SOLUBLE DEVELOPMENT INHIBITOR | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1986-04-01 | — | — | US | disclosed |
| EP-0061310-B1 | PROCESS FOR FORMING FLUORESCENT SCREEN | Hitachi, Ltd. (JP) | 1985-10-02 | — | — | EP | disclosed |
| US-4520094-A | Process for forming powder pattern on light exposed layer having photosensitive diazonium salts | HITACHI, LTD. (JP) | 1985-05-28 | — | — | US | disclosed |
| US-4377630-A | COMPRISING AN AROMATIC DIAZONIUM SALT AND N,N-DIALKYL ANILINE SALT | HITACHI, LTD. (JP) | 1983-03-22 | — | — | US | disclosed |
| JP-S57191632-A | PHOTOSENSITIVE COMPOSITION | HITACHI LTD | 1982-11-25 | — | — | JP | disclosed |
| EP-0061310-A2 | Process for forming fluorescent screen | Hitachi, Ltd. (JP) | 1982-09-29 | — | — | EP | disclosed |
| JP-S5772140-A | PHOTOSENSITIVE COMPOSITION AND FORMATION OF PATTERN | HITACHI LTD | 1982-05-06 | — | — | JP | disclosed |
| EP-0043716-A2 | Photosensitive composition and pattern forming process using same | Hitachi, Ltd. (JP) | 1982-01-13 | — | — | EP | disclosed |
| EP-0042704-A2 | Method of forming a pattern employing a photosensitive composition | Hitachi, Ltd. (JP) | 1981-12-30 | — | — | EP | disclosed |
| US-4130426-A | Heat developable light-sensitive diazotype materials and process of use | FUJI PHOTO FILM CO., LTD. (JP) | 1978-12-19 | — | — | US | disclosed |
| US-3965278-A | Method of making screens for cathode-ray tubes | U.S. PHILIPS CORPORATION (US) | 1976-06-22 | — | — | US | disclosed |