Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM5 known ✓ | P08912 | 1/20 | 0.41 |
| ▸ | ADRA2A known ✓ | P08913 | 1/20 | 0.36 |
| ▸ | ADRA2B known ✓ | P18089 | 1/20 | 0.36 |
| ▸ | ADRA2C known ✓ | P18825 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.50 |
| ▸ | TSHR | P16473 | 6/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 5/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.41 |
| ▸ | TP53 | P04637 | 2/20 | 0.41 |
| ▸ | CHKA | P35790 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 4/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.40 |
| ▸ | HBB | P68871 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL10934676 | 0.98 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL7023410 | 0.98 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL1884245 | 0.95 | ALDH1A1 (0.55) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL9859587 | 0.93 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL10975472 | 0.93 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrochloric Acid SCHEMBL7023406 | 0.93 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| SCHEMBL167901 | 0.93 | ALDH1A1 (0.58) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| SCHEMBL10932536 | 0.91 | ALDH1A1 (0.55) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Hydrogen Sulfide SCHEMBL27551222 | 0.88 | ALDH1A1 (0.52) | ALDH1A1TSHRALOX15HSD17B10MAPK1 | |
| Zinc Chloride SCHEMBL10975468 | 0.87 | ALDH1A1 (0.46) | ALDH1A1TSHRALOX15HSD17B10MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4510226-A | Photosensitive composition and pattern forming process using same | HITACHI, LTD. (JP) | 1985-04-09 | — | — | US | claimed |
| US-4377630-A | COMPRISING AN AROMATIC DIAZONIUM SALT AND N,N-DIALKYL ANILINE SALT | HITACHI, LTD. (JP) | 1983-03-22 | — | — | US | claimed |
| JP-57072140-A | — | — | None | — | — | JP | disclosed |
| US-4983500-A | Resolution, contrast | HITACHI, LTD. (JP) | 1991-01-08 | — | — | US | disclosed |
| US-4537851-A | AROMATIC DIAZONIUM COMPOUND, PHENOLIC COMPOUND, WATER SOLUBLE POLYMER | HITACHI, LTD. (JP) | 1985-08-27 | — | — | US | disclosed |
| US-4520094-A | Process for forming powder pattern on light exposed layer having photosensitive diazonium salts | HITACHI, LTD. (JP) | 1985-05-28 | — | — | US | disclosed |
| EP-0043716-B1 | PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING PROCESS USING SAME | Hitachi, Ltd. (JP) | 1985-04-10 | — | — | EP | disclosed |
| US-4510226-A | Photosensitive composition and pattern forming process using same | HITACHI, LTD. (JP) | 1985-04-09 | — | — | US | disclosed |
| EP-0100920-A1 | Photosensitive composition and pattern forming process using same | HITACHI, LTD. (JP) | 1984-02-22 | — | — | EP | disclosed |
| US-4409313-A | Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine | HITACHI, LTD. (JP) | 1983-10-11 | — | — | US | disclosed |
| US-4377630-A | COMPRISING AN AROMATIC DIAZONIUM SALT AND N,N-DIALKYL ANILINE SALT | HITACHI, LTD. (JP) | 1983-03-22 | — | — | US | disclosed |
| JP-S5772140-A | PHOTOSENSITIVE COMPOSITION AND FORMATION OF PATTERN | HITACHI LTD | 1982-05-06 | — | — | JP | disclosed |
| EP-0043716-A2 | Photosensitive composition and pattern forming process using same | Hitachi, Ltd. (JP) | 1982-01-13 | — | — | EP | disclosed |