Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | PGK1 | P00558 | 1/20 | 0.31 |
| ▸ | PGK2 | P07205 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13660339 | 0.79 | SMN1; SMN2 (0.42) | LMNAL3MBTL1ALDH1A1TP53TSHR | |
| SCHEMBL22472035 | 0.79 | SMN1; SMN2 (0.39) | LMNAL3MBTL1ALDH1A1PGK1PGK2 | |
| SCHEMBL13660342 | 0.75 | LMNA (0.36) | LMNAL3MBTL1 | |
| SCHEMBL11196421 | 0.74 | — | — | |
| SCHEMBL4948924 | 0.74 | — | — | |
| SCHEMBL160104 | 0.74 | — | — | |
| SCHEMBL967142 | 0.74 | — | — | |
| SCHEMBL967217 | 0.72 | — | — | |
| SCHEMBL967218 | 0.72 | — | — | |
| SCHEMBL11400090 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160349088-A1 | MONITORING DEVICES AND PROCESSES BASED ON TRANSFORMATION, DESTRUCTION AND CONVERSION OF NANOSTRUCTURES | PATEL GORDHANBHAI (US) | 2016-12-01 | — | — | US | disclosed |
| EP-2475612-A1 | MONITORING DEVICES AND PROCESSES BASED ON TRANSFORMATION, DESTRUCTION AND CONVERSION OF NANOSTRUCTURES | JP LABORATORIES, INC. (US) | 2012-07-18 | — | — | EP | disclosed |
| WO-2011031959-A1 | MONITORING DEVICES AND PROCESSES BASED ON TRANSFORMATION, DESTRUCTION AND CONVERSION OF NANOSTRUCTURES | JP LABORATORIES, INC. (US) | 2011-03-17 | — | — | WO | disclosed |
| US-20110003279-A1 | Monitoring devices and processes based on transformation, destruction and conversion of nanostructures | PATEL GORDHANBHAI NATHALAL | 2011-01-06 | — | — | US | disclosed |
| US-7662540-B2 | Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 | FUJIFILM CORPORATION (JP) | 2010-02-16 | — | — | US | disclosed |
| US-7556911-B2 | Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method | FUJIFILM CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| US-20080268374-A1 | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080118867-A1 | Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20080113302-A1 | Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| US-20080088813-A1 | Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 | FUJIFILM CORPORATION (JP) | 2008-04-17 | — | — | US | disclosed |
| EP-1489460-A2 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | Fuji Photo Film Co., Ltd. (JP) | 2004-12-22 | — | — | EP | disclosed |
| US-5145760-A | POSITIVE-WORKING PHOTOSENSITIVE ELECTROSTATIC MASTER WITH IMPROVED INVIRONMENTAL LATITUDE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-08 | — | — | US | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| EP-0405543-A2 | Photosensitive leuco dye containing electrostatic master with printout image | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-01-02 | — | — | EP | disclosed |
| US-4945020-A | MIXTURE OF POLYMIERC BINDER, PHOTOOXIDANT, LEUCO DYE, HALOGENATED HYDROCARBON AND PLASTICIZER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-07-31 | — | — | US | disclosed |
| US-4923781-A | STORAGE STABILITY, CONTRAST, HIGH DENSITY, PHOTOSENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 1990-05-08 | — | — | US | disclosed |
| US-4343885-A | PHOTORESISTS | DYNACHEM CORPORATION (US) | 1982-08-10 | — | — | US | disclosed |
| EP-0005380-B1 | PHOTOTROPIC PHOTOSENSITIVE COMPOSITIONS CONTAINING A FLUORAN COLORFORMER | Dynachem Corporation (US) | 1982-01-06 | — | — | EP | disclosed |
| EP-0005380-A2 | Phototropic photosensitive compositions containing a fluoran colorformer | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| US-4065315-A | Phototropic dye system and photosensitive compositions containing the same | DYNACHEM CORPORATION (US) | 1977-12-27 | — | — | US | disclosed |