SCHEMBL9880591

SCHEMBL9880591

CC(OC(=O)CC12CC3CC(CC(C3)C1)C2)C(F)(F)S(=O)(=O)O

nearest known ligand 0.44

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
ALDH1A1 P00352 5/20 0.39
MAPT P10636 1/20 0.38
NPSR1 Q6W5P4 2/20 0.38
HTT P42858 1/20 0.38
EPHX2 P34913 2/20 0.35
BPTF Q12830 1/20 0.34
THRB P10828 1/20 0.34
EPHX1 P07099 1/20 0.34
SCN9A Q15858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12088308 0.85 LMNA (0.41) LMNASMN1; SMN2ALDH1A1MAPTNPSR1
SCHEMBL16589185 0.82 SMN1; SMN2 (0.46) LMNASMN1; SMN2ALDH1A1MAPTNPSR1
SCHEMBL26059432 0.80 ALDH1A1 (0.42) LMNAALDH1A1MAPTNPSR1
SCHEMBL26059451 0.79 SCN9A (0.38) ALDH1A1SCN9A
SCHEMBL120312 0.79 CYP17A1 (0.44) ALDH1A1MAPT
SCHEMBL12257078 0.78 LMNA (0.43) LMNASMN1; SMN2ALDH1A1MAPTNPSR1
SCHEMBL27102026 0.76 LMNA (0.54) LMNASMN1; SMN2ALDH1A1MAPTNPSR1
SCHEMBL18775683 0.76 LMNA (0.40) LMNASMN1; SMN2ALDH1A1MAPTNPSR1
SCHEMBL14772489 0.76 LMNA (0.41) LMNASMN1; SMN2ALDH1A1MAPTEPHX2
SCHEMBL12745033 0.75 ALDH1A1 (0.38) LMNASMN1; SMN2ALDH1A1MAPTNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230375928-A1 Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-23 US disclosed
US-20230244142-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed
US-20230132653-A1 MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-8703384-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-22 US disclosed
US-20120135350-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230375928-A1 Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process NAF1, RALA, RSU1 LMNA 4274/4885SMN1; SMN2 2536/4885ALDH1A1 1459/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.