⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4892113 | 0.74 | CYP2C9 (0.48) | — | |
| SCHEMBL9650398 | 0.72 | GBA1 (0.33) | — | |
| SCHEMBL9650404 | 0.72 | GBA1 (0.33) | — | |
| SCHEMBL9652800 | 0.68 | — | — | |
| SCHEMBL13380574 | 0.68 | — | — | |
| SCHEMBL15923504 | 0.68 | GLB1 (0.31) | — | |
| SCHEMBL17875143 | 0.68 | GLB1 (0.37) | — | |
| SCHEMBL24506594 | 0.67 | — | — | |
| SCHEMBL15356344 | 0.67 | — | — | |
| SCHEMBL13016904 | 0.67 | CYP2C9 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9156785-B2 | Base reactive photoacid generators and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-10-13 | — | — | US | disclosed |
| US-20120129108-A1 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| WO-2010067898-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |