SCHEMBL24506594

SCHEMBL24506594

OC1CC2CC(CCS)C1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15923504 0.80 GLB1 (0.31) —
SCHEMBL17961005 0.76 — —
SCHEMBL17875143 0.75 GLB1 (0.37) —
SCHEMBL9650404 0.75 GBA1 (0.33) —
SCHEMBL9650398 0.75 GBA1 (0.33) —
SCHEMBL4892113 0.73 CYP2C9 (0.48) —
SCHEMBL17971270 0.72 — —
SCHEMBL13434647 0.70 — —
SCHEMBL1879862 0.69 — —
SCHEMBL16893285 0.68 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4012499-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2022-06-15 — — EP disclosed
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