SCHEMBL98826

SCHEMBL98826

C=C(C)C(=O)N(C1CCCCC1)C1CCCCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.41
ADH1A P07327 3/20 0.41
ADH1C P00326 2/20 0.41
PHGDH O43175 1/20 0.39
S1PR3 Q99500 3/20 0.38
GAA P10253 1/20 0.38
TRPM8 Q7Z2W7 2/20 0.37
SPHK1 Q9NYA1 1/20 0.36
KDM4E B2RXH2 1/20 0.36
MEN1 O00255 1/20 0.36
LMNA P02545 1/20 0.36
ALOX15 P16050 1/20 0.36
ALOX12 P18054 1/20 0.36
RECQL P46063 1/20 0.36
ADAM17 P78536 1/20 0.36
KMT2A Q03164 1/20 0.36
S1PR1 P21453 3/20 0.36
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 2/20 0.34
HSD11B1 P28845 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17888742 0.83 ADH1A (0.35) ADH1AADH1CPHGDHLMNARECQL
SCHEMBL1633452 0.81 FAAH (0.44) TSHRADH1AADH1CPHGDHMEN1
SCHEMBL3885312 0.81 ADH1A (0.34) ADH1AADH1CPHGDHLMNATDP1
SCHEMBL4085292 0.81 FAAH (0.44) TSHRADH1AADH1CPHGDHMEN1
SCHEMBL4086065 0.81 FAAH (0.44) TSHRADH1AADH1CPHGDHMEN1
SCHEMBL10777585 0.80 L3MBTL1 (0.45) TSHRADH1AADH1CGAAMEN1
SCHEMBL12200657 0.78 FAAH (0.41) TSHRADH1AADH1CPHGDHMEN1
SCHEMBL12198758 0.78 L3MBTL1 (0.43) TSHRADH1AADH1CGAAMEN1
SCHEMBL1712105 0.77 SPHK1 (0.47) TSHRADH1AADH1CPHGDHS1PR3
SCHEMBL12534531 0.76 TSHR (0.34) TSHRADH1AADH1CGAATRPM8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 154 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5698361-A DIAZONIUM COMPOUND, POLYMERIC BINDER; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US claimed
WO-2023067852-A1 LAYERED PRODUCT AND PACKAGING MATERIAL DIC株式会社 2023-04-27 WO disclosed
US-10513573-B2 Process for producing silver nanowires and agent for controlling growth of silver nanowires SEIKO PMC CORPORATION (JP) 2019-12-24 US disclosed
US-20170174804-A1 Process for Producing Silver Nanowires and Agent for Controlling Growth of Silver Nanowires CHEMIPAZ CORPORATION (JP) 2017-06-22 US disclosed
US-9664827-B2 Colored composition, method of producing color filter using the same, color filter and solid-state imaging device FUJIFILM CORPORATION (JP) 2017-05-30 US disclosed
EP-2611752-B1 DISPERSANT FOR GYPSUM PLASTER COMPOSITIONS SIKA TECH AG (CH) 2017-04-26 EP disclosed
US-9630250-B2 Process for producing silver nanowires and agent for controlling growth of silver nanowires SEIKO PMC CORPORATION (JP) 2017-04-25 US disclosed
US-9632222-B2 Method for manufacturing a color filter, color filter and solid-state imaging device FUJIFILM CORPORATION (JP) 2017-04-25 US disclosed
US-9625618-B2 Optical member set and solid-state imaging element using the same FUJIFILM CORPORATION (JP) 2017-04-18 US disclosed
EP-2799913-B1 OPTICAL MEMBER SET AND SOLID-STATE IMAGE SENSOR USING SAME FUJIFILM CORP (JP) 2017-02-01 EP disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20020032290-A1 Preparation process of acrylic acid ester polymer KURARAY CO., LTD. (JP) 2002-03-14 US disclosed
US-6329480-B1 POLYMERIZING ACRYLIC ACID ESTER, ACRYLIC/METHACRYLIC MONOMER PRESENCE OF AN ORGANOLITHIUM COMPOUND AND AN ORGANOALUMINUM COMPOUND TO FORM BLOCK COPOLYMER KURARAY CO., LTD. (JP) 2001-12-11 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
EP-0945470-A1 Preparation process of acrylic acid ester polymer KURARAY CO., LTD. (JP) 1999-09-29 EP disclosed
US-5486544-A AROMATIC SULFINATE POLYMERIZATION CATALYST KURARAY CO., LTD. (JP) 1996-01-23 US disclosed
EP-0408357-B1 Polymerizable composition KURARAY CO (JP) 1994-06-01 EP disclosed
EP-0408357-A2 Polymerizable composition KURARAY CO., LTD. (JP) 1991-01-16 EP disclosed
US-4144388-A Film-forming and thermocurable vinyl alcohol-substituted acrylamide copolymers and process for production thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1979-03-13 US disclosed