SCHEMBL989084

SCHEMBL989084

COCC(C)COC=Cc1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
NPC1 O15118 1/20 0.41
MTOR P42345 1/20 0.41
TP53 P04637 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
MAPK1 P28482 1/20 0.41
CYP2C19 P33261 1/20 0.41
HSD17B10 Q99714 1/20 0.41
HTR2A P28223 3/20 0.40
CHRNB2 P17787 1/20 0.40
CHRNA7 P36544 1/20 0.40
KDM4E B2RXH2 1/20 0.40
GMNN O75496 1/20 0.40
LMNA P02545 1/20 0.40
HPGD P15428 1/20 0.40
PMP22 Q01453 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4907279 0.84 TP53 (0.41) MEN1KMT2ANPC1MTORTP53
SCHEMBL8383667 0.84 TP53 (0.41) MEN1KMT2ANPC1MTORTP53
SCHEMBL7770602 0.82 NPC1 (0.45) NPC1MTORTP53CYP3A4CYP2D6
SCHEMBL5670358 0.82 NPC1 (0.45) NPC1MTORTP53CYP3A4CYP2D6
SCHEMBL11793042 0.80 TRPA1 (0.42) NPC1MTORTP53CYP3A4CYP2D6
SCHEMBL10489672 0.79 LMNA (0.48) MEN1KMT2ANPC1MTORTP53
SCHEMBL8093709 0.78 MEN1 (0.50) MEN1KMT2ANPC1TP53CYP3A4
SCHEMBL5157825 0.76 TRPA1 (0.45) MEN1KMT2ATP53CYP3A4HSD17B10
SCHEMBL8057322 0.75 HTR2A (0.42) NPC1MTORTP53CYP3A4CYP2D6
SCHEMBL13686299 0.75 MAOB (0.48) MEN1KMT2ACYP2D6CYP2C9MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2270596-B1 Positive resist compostion and pattern forming process SHINETSU CHEMICAL CO (JP) 2018-07-25 EP disclosed
EP-2146247-B1 Resist patterning process and manufacturing photo mask SHINETSU CHEMICAL CO (JP) 2015-04-15 EP disclosed
EP-2270596-A2 Positive resist compostion and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2011-01-05 EP disclosed
EP-2146247-A1 Resist patterning process and manufacturing photo mask Shin-Etsu Chemical Co., Ltd. (JP) 2010-01-20 EP disclosed
US-20080020289-A1 Novel polymer, positive resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-01-24 US disclosed