SCHEMBL9891443

SCHEMBL9891443

CC(C)(C)OC(=O)CCCNCC(=O)OC(C)(C)C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 1/20 0.46
MAOB P27338 1/20 0.46
EPHX2 P34913 1/20 0.41
TDP1 Q9NUW8 1/20 0.37
TSHR P16473 1/20 0.37
MEN1 O00255 1/20 0.35
GAA P10253 1/20 0.35
KMT2A Q03164 1/20 0.35
FPR3 P25089 1/20 0.34
FPR2 P25090 1/20 0.34
RECQL P46063 1/20 0.34
CA2 P00918 2/20 0.34
CA12 O43570 1/20 0.34
CA14 Q9ULX7 1/20 0.34
HDAC8 Q9BY41 1/20 0.34
PTPRC P08575 2/20 0.33
CTSK P43235 2/20 0.33
CYP2D6 P10635 1/20 0.33
CA1 P00915 1/20 0.33
CA7 P43166 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7432213 0.93 TSHR (0.48) MAOAMAOBEPHX2TDP1TSHR
SCHEMBL31226873 0.90 EPHX2 (0.44) MAOAMAOBEPHX2TDP1TSHR
SCHEMBL2137955 0.89 MAOA (0.44) MAOAMAOBEPHX2TDP1TSHR
SCHEMBL693387 0.89 MAOA (0.44) MAOAMAOBEPHX2TDP1TSHR
SCHEMBL25525668 0.89 MAOA (0.42) MAOAMAOBEPHX2TDP1TSHR
SCHEMBL12581334 0.88 MAOA (0.41) MAOAMAOBEPHX2TDP1MEN1
SCHEMBL7428662 0.88 GAA (0.47) MAOAMAOBEPHX2TDP1TSHR
SCHEMBL7429955 0.87 TSHR (0.47) MAOAMAOBEPHX2TDP1TSHR
SCHEMBL7016949 0.87 RECQL (0.47) MAOAMAOBEPHX2TDP1TSHR
SCHEMBL4907521 0.87 MAOA (0.45) MAOAMAOBEPHX2TDP1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
EP-2463714-B1 Basic compound, chemically amplified resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-28 EP disclosed
EP-2463714-A1 Basic compound, chemically amplified resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-06-13 EP disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS GABRA5, GABRB1, GABBR1 MAOA 221/4885MAOB 460/4885EPHX2 2573/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.