SCHEMBL9891448

SCHEMBL9891448

CC(C)(C)OC(=O)CCCNc1ccc2ccc3cccc4ccc1c2c34

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 6/20 0.47
ALDH1A1 P00352 5/20 0.47
MAPT P10636 4/20 0.47
HPGD P15428 3/20 0.47
KMT2A Q03164 4/20 0.39
MEN1 O00255 2/20 0.39
HDAC1 Q13547 1/20 0.39
HDAC7 Q8WUI4 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
HDAC6 Q9UBN7 1/20 0.39
CNR1 P21554 1/20 0.38
CNR2 P34972 1/20 0.38
NQO2 P16083 1/20 0.37
HSD17B10 Q99714 3/20 0.36
CYP1A2 P05177 1/20 0.36
GLA P06280 1/20 0.36
POLB P06746 1/20 0.36
CYP2D6 P10635 1/20 0.36
MGLL Q99685 1/20 0.36
TOP2A P11388 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9891451 0.84 ALDH1A1 (0.54) KDM4EALDH1A1MAPTHPGDKMT2A
SCHEMBL9891450 0.81 CA12 (0.41) KDM4EALDH1A1MAPTHPGDKMT2A
SCHEMBL1672450 0.80 TOP2A (0.48) KDM4EALDH1A1MAPTHPGDCNR1
SCHEMBL25718059 0.76 HPGD (0.60) KDM4EALDH1A1MAPTHPGDKMT2A
SCHEMBL17119894 0.76 KMT2A (0.57) KDM4EALDH1A1MAPTHPGDKMT2A
SCHEMBL2315443 0.74 MAPT (0.50) KDM4EALDH1A1MAPTHPGDKMT2A
SCHEMBL25718433 0.74 ALDH1A1 (0.54) KDM4EALDH1A1MAPTHPGDKMT2A
SCHEMBL19514723 0.74 ALDH1A1 (0.45) KDM4EALDH1A1MAPTHPGDKMT2A
SCHEMBL19514697 0.74 ALDH1A1 (0.45) KDM4EALDH1A1MAPTHPGDKMT2A
SCHEMBL25718063 0.73 ALDH1A1 (0.43) KDM4EALDH1A1MAPTHPGDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
EP-2463714-B1 Basic compound, chemically amplified resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-28 EP disclosed
EP-2463714-A1 Basic compound, chemically amplified resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-06-13 EP disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS GABRA5, GABRB1, GABBR1 KDM4E 1359/4885ALDH1A1 789/4885MAPT 2995/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.