Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14527282 | 0.81 | MEN1 (0.34) | HSD11B1ALDH1A1HTT | |
| SCHEMBL16904311 | 0.77 | HSD11B1 (0.40) | HSD11B1 | |
| SCHEMBL4740020 | 0.76 | ALDH1A1 (0.33) | HSD11B1ALDH1A1L3MBTL1GLAHTT | |
| SCHEMBL1632303 | 0.75 | ALDH1A1 (0.33) | HSD11B1ALDH1A1L3MBTL1GLAHTT | |
| SCHEMBL9908346 | 0.75 | HSD11B1 (0.34) | HSD11B1ALDH1A1L3MBTL1HTTSLC6A4 | |
| SCHEMBL27948270 | 0.74 | HSD11B1 (0.33) | HSD11B1ALDH1A1L3MBTL1GLASLC6A3 | |
| Hydrochloric Acid SCHEMBL1632301 | 0.74 | ALDH1A1 (0.32) | HSD11B1ALDH1A1L3MBTL1GLA | |
| SCHEMBL21174557 | 0.72 | HSD11B1 (0.32) | HSD11B1ALDH1A1L3MBTL1GLASLC6A3 | |
| SCHEMBL27564593 | 0.72 | HSD11B1 (0.32) | HSD11B1ALDH1A1L3MBTL1GLA | |
| SCHEMBL32688579 | 0.69 | ALDH1A1 (0.31) | HSD11B1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |