Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9908332 | 0.90 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL12009286 | 0.84 | CHRM2 (0.33) | HSD11B1ALDH1A1HTT | |
| SCHEMBL20097868 | 0.81 | HSD11B1 (0.36) | HSD11B1ALDH1A1HTT | |
| SCHEMBL12928183 | 0.81 | CYP17A1 (0.35) | HSD11B1 | |
| SCHEMBL13758545 | 0.80 | HSD11B1 (0.40) | HSD11B1 | |
| SCHEMBL12009282 | 0.79 | ALDH1A1 (0.32) | ALDH1A1HTT | |
| SCHEMBL12009844 | 0.79 | EPHX2 (0.36) | HSD11B1ALDH1A1HTT | |
| SCHEMBL12968046 | 0.77 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL9908328 | 0.75 | HSD11B1 (0.33) | HSD11B1ALDH1A1HTTSLC6A4SLC6A3 | |
| SCHEMBL4740020 | 0.73 | ALDH1A1 (0.33) | HSD11B1ALDH1A1HTTL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-7579131-B2 | Positive resist composition and method of forming resist pattern using the same | FUJIFILM CORPORATION (JP) | 2009-08-25 | — | — | US | disclosed |
| US-7579131-B2 | Positive resist composition and method of forming resist pattern using the same | FUJIFILM CORPORATION (JP) | 2009-08-25 | — | — | US | disclosed |
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |