SCHEMBL9908403

SCHEMBL9908403

CC1(F)C2CCC(O2)C1(F)F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 5/20 0.39
TP53 P04637 4/20 0.39
HIF1A Q16665 3/20 0.39
NPC1 O15118 3/20 0.39
LMNA P02545 3/20 0.39
RAB9A P51151 3/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
NFKB1 P19838 2/20 0.39
THPO P40225 2/20 0.39
GMNN O75496 2/20 0.39
MTOR P42345 2/20 0.39
BLM P54132 2/20 0.39
PMP22 Q01453 2/20 0.39
CYP2C19 P33261 1/20 0.39
STAT6 P42226 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
CYP3A4 P08684 3/20 0.38
CYP1A2 P05177 2/20 0.38
PPM1B O75688 1/20 0.38
PTPN1 P18031 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23163977 0.67 MAPK1 (0.48) MAPK1TP53HIF1ANPC1LMNA
SCHEMBL15542692 0.58 MAPK1 (0.39) MAPK1TP53HIF1ANPC1LMNA
SCHEMBL9908350 0.57 LMNA (0.31) MAPK1LMNAMAPTTSHR
Cantharidic_Acid SCHEMBL13091537 0.56 MAPK1 (1.00) MAPK1TP53HIF1ANPC1LMNA
Cantharidic_Acid SCHEMBL24226002 0.56 MAPK1 (1.00) MAPK1TP53HIF1ANPC1LMNA
SCHEMBL14893098 0.55
SCHEMBL15543407 0.55 MAPK1 (0.40) MAPK1TP53HIF1ANPC1LMNA
SCHEMBL13556828 0.55 MAPK1 (0.40) MAPK1TP53HIF1ANPC1LMNA
SCHEMBL15542464 0.55 CHRNB2 (0.43) MAPK1TP53HIF1ANPC1LMNA
Cantharidin SCHEMBL152262 0.55 MAPK1 (1.00) MAPK1TP53HIF1ANPC1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448482-B2 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-20150253673-A1 PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed