Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 10/20 | 0.34 |
| ▸ | SLC6A2 | P23975 | 9/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 9/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 7/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 4/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | DRD2 | P14416 | 1/20 | 0.33 |
| ▸ | HTR2C | P28335 | 1/20 | 0.32 |
| ▸ | HTR2B | P41595 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13558693 | 0.82 | KDM4E (0.45) | KDM4ECYP3A4MEN1KMT2A | |
| SCHEMBL9911674 | 0.81 | CYP2C19 (0.44) | CYP2D6CYP3A4MEN1CYP2C19KMT2A | |
| SCHEMBL9809156 | 0.78 | SLC6A4 (0.47) | KDM4ESLC6A4SLC6A2SLC6A3CYP2D6 | |
| SCHEMBL11410636 | 0.75 | TAAR1 (0.43) | SLC6A4SLC6A2SLC6A3CYP2D6KCNH2 | |
| SCHEMBL11410727 | 0.75 | HTR2A (0.42) | SLC6A4SLC6A2SLC6A3KCNH2HTR2C | |
| SCHEMBL5329930 | 0.74 | KDM4E (0.53) | KDM4ESLC6A4SLC6A2SLC6A3CYP2D6 | |
| SCHEMBL14077386 | 0.74 | CYP2A6 (0.43) | KDM4ESLC6A4SLC6A2SLC6A3CYP2D6 | |
| SCHEMBL10452473 | 0.72 | NPC1 (0.54) | KDM4ESLC6A4SLC6A2SLC6A3MEN1 | |
| SCHEMBL1725362 | 0.70 | MAPT (0.50) | KDM4ECYP3A4MEN1CYP2C19KMT2A | |
| SCHEMBL19221186 | 0.70 | MAOA (0.48) | SLC6A4SLC6A2SLC6A3DRD2HTR2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120142193-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-07 | — | — | US | disclosed |