Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.44 |
| ▸ | GRM1 | Q13255 | 6/20 | 0.44 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | CTSV | O60911 | 1/20 | 0.36 |
| ▸ | CTSL | P07711 | 1/20 | 0.36 |
| ▸ | CTSS | P25774 | 1/20 | 0.36 |
| ▸ | CTSK | P43235 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17550548 | 0.87 | CYP19A1 (0.47) | CYP19A1GRM1ATMALDH1A1EPHX2 | |
| SCHEMBL786222 | 0.87 | ATM (0.46) | CYP19A1GRM1ATMALDH1A1EPHX2 | |
| SCHEMBL26016653 | 0.84 | ATM (0.46) | CYP19A1GRM1ATMALDH1A1EPHX2 | |
| SCHEMBL12705300 | 0.81 | CYP19A1 (0.47) | CYP19A1GRM1ATMALDH1A1EPHX2 | |
| SCHEMBL13657228 | 0.81 | GRM1 (0.39) | CYP19A1GRM1ATMALDH1A1EPHX2 | |
| SCHEMBL824268 | 0.80 | GRM1 (0.38) | CYP19A1GRM1ATMALDH1A1EPHX2 | |
| SCHEMBL24134018 | 0.78 | CYP19A1 (0.42) | CYP19A1GRM1ATMALDH1A1EPHX2 | |
| SCHEMBL6854496 | 0.78 | CYP19A1 (0.47) | CYP19A1GRM1ATMALDH1A1EPHX2 | |
| SCHEMBL11948913 | 0.78 | HSD11B1 (0.37) | ALDH1A1EPHX2CTSVCTSLCTSS | |
| SCHEMBL950697 | 0.78 | CYP19A1 (0.52) | CYP19A1GRM1ATMALDH1A1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9822060-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-21 | — | — | US | disclosed |
| US-9760005-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9758466-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9671692-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9671692-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9644056-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-09 | — | — | US | disclosed |
| US-9638996-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9638996-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9612533-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-04-04 | — | — | US | disclosed |
| US-20150147695-A1 | RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20150118620-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-30 | — | — | US | disclosed |
| US-20150118619-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-30 | — | — | US | disclosed |
| US-20150118620-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-04-30 | — | — | US | disclosed |
| US-8859183-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8753794-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20140038106-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2014-02-06 | — | — | US | disclosed |
| US-8486606-B2 | Acrylate derivative, haloester derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2013-07-16 | — | — | US | disclosed |
| US-20120148954-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20110117497-A1 | ACRYLATE DERIVATIVE, HALOESTER DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2011-05-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120148954-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | COASY, ARCN1, CLTB | CYP19A1 627/4885GRM1 1966/4885ATM 871/4885 |
| US-20110117497-A1 | ACRYLATE DERIVATIVE, HALOESTER DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | ARCN1, H1-10, RER1 | CYP19A1 2519/4885GRM1 1528/4885ATM 203/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.