SCHEMBL9925215

SCHEMBL9925215

CCC(C)(C)C(=O)OC1C2CCC(O2)C1OC(=O)N(C)C

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 2/20 0.31
PTPN1 P18031 2/20 0.31
PPP1CC P36873 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9925217 0.82 PPM1B (0.33) PPM1BPTPN1PPP1CC
SCHEMBL9925212 0.81 DPP4 (0.30)
SCHEMBL9925216 0.80 PPM1B (0.31) PPM1BPTPN1PPP1CC
SCHEMBL2601718 0.78 CA12 (0.32) PPM1BPTPN1PPP1CC
SCHEMBL9925206 0.77 CHRM3 (0.36)
SCHEMBL9925235 0.77 HSD11B1 (0.38)
SCHEMBL12202200 0.76
SCHEMBL9925233 0.76 HSD11B1 (0.40)
SCHEMBL9925234 0.75 GAA (0.35)
SCHEMBL13655657 0.72 PPM1B (0.36) PPM1BPTPN1PPP1CC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8987386-B2 Method of producing polymeric compound, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-03-24 US disclosed
US-8658343-B2 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2014-02-25 US disclosed
US-20120328993-A1 METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-12-27 US disclosed
US-20120148953-A1 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed