SCHEMBL9925206

SCHEMBL9925206

CCC(C)(C)C(=O)OC1CCC(OC(=O)N(C)C)CC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM3 P20309 4/20 0.36
BCHE P06276 2/20 0.35
CHRM2 P08172 2/20 0.35
CHRM1 P11229 2/20 0.35
MLNR O43193 1/20 0.35
HTR2A P28223 1/20 0.35
HTR2C P28335 1/20 0.35
HRH1 P35367 1/20 0.35
OPRM1 P35372 1/20 0.35
DRD3 P35462 1/20 0.35
OPRK1 P41145 1/20 0.35
HTR2B P41595 1/20 0.35
SLC6A3 Q01959 1/20 0.35
KCNH2 Q12809 1/20 0.35
CACNA1C Q13936 1/20 0.35
DPP4 P27487 2/20 0.32
DPP8 Q6V1X1 2/20 0.32
DPP9 Q86TI2 2/20 0.32
HMGCR P04035 1/20 0.32
CHRM4 P08173 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3434648 0.88 EPHX1 (0.37) CHRM3CHRM2CHRM1MLNRHTR2A
SCHEMBL1628201 0.81 LMNA (0.36) CHRM3CHRM2CHRM1MLNRHTR2A
SCHEMBL132269 0.81 CYP19A1 (0.40) CHRM3CHRM2CHRM1MLNRHTR2A
SCHEMBL2625661 0.81 CHRM3 (0.34) CHRM3CHRM2CHRM1MLNRHTR2A
SCHEMBL18119952 0.81 FKBP1A (0.34) CHRM3CHRM2CHRM1MLNRHTR2A
SCHEMBL2754858 0.81 CHRM3 (0.34) CHRM3CHRM2CHRM1MLNRHTR2A
SCHEMBL2625659 0.81 APOBEC3A (0.36) CHRM3CHRM2CHRM1MLNRHTR2A
SCHEMBL3435204 0.80 EPHX1 (0.43) CHRM3CHRM2CHRM1MLNRHTR2A
SCHEMBL132134 0.80 EPHX1 (0.47) CHRM3CHRM2CHRM1MLNRHTR2A
SCHEMBL25856259 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8987386-B2 Method of producing polymeric compound, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-03-24 US disclosed
US-8658343-B2 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2014-02-25 US disclosed
US-20120328993-A1 METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-12-27 US disclosed
US-20120148953-A1 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed