SCHEMBL9925233

SCHEMBL9925233

CCC(C)(C)C(=O)OC1C2CCC(O2)C1OC(=O)N1CCCCC1

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.40
HPGD P15428 1/20 0.37
FKBP1A P62942 5/20 0.34
ALDH1A1 P00352 2/20 0.33
MAPT P10636 2/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
THRB P10828 1/20 0.33
ATM Q13315 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
PREP P48147 2/20 0.32
NPC1 O15118 1/20 0.32
HTT P42858 1/20 0.32
RAB9A P51151 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
TFPI2 P48307 1/20 0.32
KDM4E B2RXH2 1/20 0.31
POLB P06746 1/20 0.31
EPHX1 P07099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9925235 0.99 HSD11B1 (0.38) HSD11B1HPGDFKBP1AALDH1A1MAPT
SCHEMBL9925234 0.89 GAA (0.35) HSD11B1HPGDALDH1A1MEN1KMT2A
SCHEMBL9925231 0.83 HSD11B1 (0.48) HSD11B1HPGDFKBP1AALDH1A1MAPT
SCHEMBL9925230 0.82 HSD11B1 (0.46) HSD11B1HPGDFKBP1AALDH1A1PREP
SCHEMBL9925225 0.80 HPGD (0.41) HSD11B1HPGDFKBP1AALDH1A1MAPT
SCHEMBL9925217 0.78 PPM1B (0.33) ATM
SCHEMBL9925226 0.78 TPSAB1 (0.40) HSD11B1HPGDFKBP1AALDH1A1THRB
SCHEMBL9925215 0.76 PPM1B (0.31)
SCHEMBL9925216 0.76 PPM1B (0.31)
SCHEMBL12202200 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8987386-B2 Method of producing polymeric compound, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-03-24 US disclosed
US-8658343-B2 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2014-02-25 US disclosed
US-20120328993-A1 METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-12-27 US disclosed
US-20120148953-A1 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed