SCHEMBL9925224

SCHEMBL9925224

CCC(C)(C)C(=O)OC1CCC(OC(=O)N2CCC(C)CC2)CC1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TPSAB1 Q15661 6/20 0.39
TPSD1 Q9BZJ3 6/20 0.39
TPSG1 Q9NRR2 6/20 0.39
GAA P10253 2/20 0.38
ALDH1A1 P00352 3/20 0.38
NPC1 O15118 1/20 0.38
CHRM3 P20309 1/20 0.37
THRB P10828 1/20 0.35
ATM Q13315 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
HRH3 Q9Y5N1 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
NOS3 P29474 1/20 0.34
NOS2 P35228 1/20 0.34
TP53 P04637 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9925226 0.88 TPSAB1 (0.40) TPSAB1TPSD1TPSG1GAAALDH1A1
SCHEMBL9925225 0.87 HPGD (0.41) TPSAB1TPSD1TPSG1ALDH1A1THRB
SCHEMBL132269 0.85 CYP19A1 (0.40) CHRM3
SCHEMBL9925232 0.81 HSD11B1 (0.37) GAAALDH1A1NPC1TP53TDP1
SCHEMBL11963825 0.81 CHRM3 (0.37) TPSAB1TPSD1TPSG1GAACHRM3
SCHEMBL10329379 0.81 HPGD (0.48) THRBHPGD
SCHEMBL3434648 0.81 EPHX1 (0.37) NPC1CHRM3
SCHEMBL9925234 0.80 GAA (0.35) GAAALDH1A1NPC1HRH3MEN1
SCHEMBL10447869 0.80 HPGD (0.38) TPSAB1TPSD1TPSG1GAACHRM3
SCHEMBL9926169 0.77 GAA (0.45) TPSAB1TPSD1TPSG1GAAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8987386-B2 Method of producing polymeric compound, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-03-24 US disclosed
US-8658343-B2 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2014-02-25 US disclosed
US-20120328993-A1 METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-12-27 US disclosed
US-20120148953-A1 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed