⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9927406 | 0.86 | LMNA (0.32) | — | |
| SCHEMBL9927404 | 0.85 | LMNA (0.33) | — | |
| SCHEMBL9927410 | 0.83 | ALDH1A1 (0.33) | — | |
| SCHEMBL9927418 | 0.81 | PRKCA (0.31) | — | |
| SCHEMBL9927429 | 0.79 | LMNA (0.32) | — | |
| SCHEMBL9927419 | 0.79 | — | — | |
| SCHEMBL9927411 | 0.75 | — | — | |
| SCHEMBL9927422 | 0.73 | ALDH1A1 (0.33) | — | |
| SCHEMBL493608 | 0.73 | LMNA (0.31) | — | |
| SCHEMBL12121036 | 0.72 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8541606-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8541606-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20120149921-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120149921-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-8105746-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-8105746-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20090029290-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| US-20090029290-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |