Isophthalic Acid

Isophthalic Acid

SCHEMBL9930191

N.O=C([O-])c1cccc(C(=O)O)c1.[H+]

nearest known ligand 0.61

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.54
CA4 P22748 1/20 0.54
CA1 P00915 2/20 0.54
CA9 Q16790 2/20 0.54
CA12 O43570 1/20 0.54
CA6 P23280 1/20 0.54
KMO O15229 1/20 0.50
CYP1A2 P05177 1/20 0.50
CYP2C9 P11712 1/20 0.50
HPGD P15428 1/20 0.50
HSD17B10 Q99714 1/20 0.50
TP53 P04637 1/20 0.50
UNG P13051 1/20 0.48
DAO P14920 1/20 0.48
TSHR P16473 1/20 0.48
NAPRT Q6XQN6 1/20 0.48
FOLH1 Q04609 1/20 0.47
AKR1C3 P42330 1/20 0.47
L3MBTL1 Q9Y468 2/20 0.46
ATM Q13315 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Isophthalic Acid SCHEMBL6378446 0.93 CA2 (0.56) CA2CA4CA1CA9CA12
Isophthalic Acid SCHEMBL11436838 0.93 CA2 (0.56) CA2CA4CA1CA9CA12
Isophthalic Acid SCHEMBL31187513 0.93 CA2 (0.62) CA2CA4CA1CA9CA12
Isophthalic Acid SCHEMBL725833 0.93 CA2 (0.62) CA2CA4CA1CA9CA12
Isophthalic Acid SCHEMBL15571213 0.91 CA2 (0.54) CA2CA4CA1CA9CA12
Isophthalic Acid SCHEMBL15571521 0.91 CA2 (0.54) CA2CA4CA1CA9CA12
Isophthalic Acid SCHEMBL2060009 0.90 CA2 (0.48) CA2CA4CA1CA9CA12
Isophthalic Acid SCHEMBL15572660 0.89 CA2 (0.52) CA2CA4CA1CA9CA12
Isophthalic Acid SCHEMBL15573521 0.89 CA2 (0.58) CA2CA4CA1CA9CA12
Isophthalic Acid SCHEMBL11317807 0.89 CA2 (0.59) CA2CA4CA1CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116457409-A Chloroprene rubber composition, sulfide of the chloroprene rubber composition, and vulcanized molded article of the chloroprene rubber composition 电化株式会社 2023-07-18 CN disclosed
EP-2475000-B1 PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME WAKO PURE CHEM IND LTD (JP) 2015-07-01 EP disclosed
US-9034810-B2 Processing agent composition for semiconductor surface and method for processing semiconductor surface using same WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2015-05-19 US disclosed
EP-2475000-A1 PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME Wako Pure Chemical Industries, Ltd. (JP) 2012-07-11 EP disclosed
US-20120157368-A1 PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-06-21 US disclosed