Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 3/20 | 0.38 |
| ▸ | HRH1 | P35367 | 3/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | TRPM8 | Q7Z2W7 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.36 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11870472 | 0.98 | HTR2A (0.39) | HTR2AHRH1LMNATDP1TRPM8 | |
| Hydrochloric Acid SCHEMBL9934286 | 0.96 | TDP1 (0.41) | HTR2AHRH1LMNATDP1TRPM8 | |
| Bromide SCHEMBL9934306 | 0.96 | HTR2A (0.38) | HTR2AHRH1LMNATDP1TRPM8 | |
| SCHEMBL9934658 | 0.84 | RAB9A (0.38) | LMNATDP1TRPM8SMN1; SMN2CYP2C19 | |
| SCHEMBL22073549 | 0.82 | HTR2A (0.38) | HTR2AHRH1LMNATDP1TRPM8 | |
| SCHEMBL15389921 | 0.82 | SMN1; SMN2 (0.34) | LMNATDP1TRPM8SMN1; SMN2CYP2C19 | |
| Hydrochloric Acid SCHEMBL17364017 | 0.81 | TDP1 (0.40) | HTR2AHRH1LMNATDP1TRPM8 | |
| SCHEMBL6391995 | 0.80 | CYP2C19 (0.41) | HTR2AHRH1TDP1SMN1; SMN2CYP2C19 | |
| SCHEMBL6391998 | 0.80 | CYP2C19 (0.41) | HTR2AHRH1TDP1SMN1; SMN2CYP2C19 | |
| SCHEMBL10526918 | 0.79 | SLC6A2 (0.42) | HTR2AHRH1SMN1; SMN2CYP2C19SIGMAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107075036-B | Polyacrylamide resin, papermaking additive and paper | HARIMA CHEMICALS, INC. (JP) | 2019-11-01 | — | — | CN | disclosed |
| CN-110003386-A | Polyacrylamide resin, additive for paper making and paper | 哈利玛化成株式会社 | 2019-07-12 | — | — | CN | disclosed |
| CN-107075036-A | Polyacrylamide resin, papermaking additive and paper | 哈利玛化成株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-102533220-B | Polishing composition for magnetic disk substrate | KAO CORP. (JP) | 2015-11-18 | — | — | CN | disclosed |
| US-9159352-B2 | Polishing liquid composition for magnetic disk substrate | KAO CORPORATION (JP) | 2015-10-13 | — | — | US | disclosed |
| CN-103503068-A | Manufacturing method of magnetic disk substrate | KAO CORP | 2014-01-08 | — | — | CN | disclosed |
| US-20140001155-A1 | MANUFACTURING METHOD OF MAGNETIC DISK SUBSTRATE | KAO CORPORATION (JP) | 2014-01-02 | — | — | US | disclosed |
| US-20130309946-A1 | METHOD FOR MANUFACTURING MAGNETIC DISC SUBSTRATE | KAO CORPORATION (JP) | 2013-11-21 | — | — | US | disclosed |
| CN-103339673-A | Method for manufacturing magnetic disc substrate | KAO CORP | 2013-10-02 | — | — | CN | disclosed |
| CN-101687698-B | Glass fiber sizing agent containing amphoteric polymer compound | NITTO BOSEKI CO LTD | 2012-08-01 | — | — | CN | disclosed |
| CN-102533220-A | Polishing composition for magnetic disk substrate | KAO CORP | 2012-07-04 | — | — | CN | disclosed |
| US-20120156968-A1 | POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE | KAO CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| CN-101687698-A | Glass fiber sizing agent containing amphoteric polymer compound | NITTO BOSEKI CO LTD | 2010-03-31 | — | — | CN | disclosed |