Hydrochloric Acid

Hydrochloric Acid

SCHEMBL9934286

C=CCN(CC=C)C(CC)c1ccccc1.Cl

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
HTR2A known ✓ P28223 3/20 0.38
HRH1 known ✓ P35367 3/20 0.38
SIGMAR1 known ✓ Q99720 1/20 0.36
TDP1 Q9NUW8 1/20 0.41
LMNA P02545 2/20 0.38
TRPM8 Q7Z2W7 1/20 0.37
SMN1; SMN2 Q16637 3/20 0.37
CYP2C19 P33261 1/20 0.36
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
AOC3 Q16853 1/20 0.34
POLB P06746 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11870472 0.98 HTR2A (0.39) TDP1HTR2AHRH1LMNATRPM8
Iodide SCHEMBL9933723 0.96 HTR2A (0.38) TDP1HTR2AHRH1LMNATRPM8
Bromide SCHEMBL9934306 0.96 HTR2A (0.38) TDP1HTR2AHRH1LMNATRPM8
Hydrochloric Acid SCHEMBL17364017 0.84 TDP1 (0.40) TDP1HTR2AHRH1LMNATRPM8
SCHEMBL9934658 0.84 RAB9A (0.38) TDP1LMNATRPM8SMN1; SMN2CYP2C19
SCHEMBL22073549 0.82 HTR2A (0.38) TDP1HTR2AHRH1LMNATRPM8
SCHEMBL15389921 0.82 SMN1; SMN2 (0.34) TDP1LMNATRPM8SMN1; SMN2CYP2C19
SCHEMBL6391995 0.80 CYP2C19 (0.41) TDP1HTR2AHRH1SMN1; SMN2CYP2C19
SCHEMBL6391998 0.80 CYP2C19 (0.41) TDP1HTR2AHRH1SMN1; SMN2CYP2C19
Hydrochloric Acid SCHEMBL2455720 0.79 MEN1 (0.45) TDP1HTR2AHRH1LMNATRPM8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109266058-A A kind of catalysis process and application method of aqueous inorganic nano paint 湖南凯斯利新材料有限公司 2019-01-25 CN claimed
CN-106833776-B Situ-formed graft is modified the method that lignite prepares slurries additive agent 中国五环工程有限公司 2018-10-19 CN claimed
CN-106833776-A The method that the modified lignite of situ-formed graft prepares slurries additive agent 中国五环工程有限公司 2017-06-13 CN claimed
CN-101735076-B Method for preparing high-purity cationic monomer diallyl ethylbenzylammonium chloride UNIV HUNAN SCI & TECHNOLOGY 2013-06-12 CN claimed
CN-101735076-A Method for preparing high-purity cationic monomer diallyl ethylbenzylammonium chloride UNIV HUNAN SCI & TECHNOLOGY 2010-06-16 CN claimed
CN-112029027-B Graphene composite cationic emulsion and preparation method thereof 厦门捌斗新材料科技有限公司 2022-11-18 CN disclosed
CN-112029027-A Graphene composite cationic emulsion and preparation method thereof 厦门捌斗新材料科技有限公司 2020-12-04 CN disclosed
CN-107075036-B Polyacrylamide resin, papermaking additive and paper HARIMA CHEMICALS, INC. (JP) 2019-11-01 CN disclosed
CN-110003386-A Polyacrylamide resin, additive for paper making and paper 哈利玛化成株式会社 2019-07-12 CN disclosed
CN-109266058-A A kind of catalysis process and application method of aqueous inorganic nano paint 湖南凯斯利新材料有限公司 2019-01-25 CN disclosed
CN-106833776-B Situ-formed graft is modified the method that lignite prepares slurries additive agent 中国五环工程有限公司 2018-10-19 CN disclosed
CN-107075036-A Polyacrylamide resin, papermaking additive and paper 哈利玛化成株式会社 2017-08-18 CN disclosed
CN-101735076-B Method for preparing high-purity cationic monomer diallyl ethylbenzylammonium chloride UNIV HUNAN SCI & TECHNOLOGY 2013-06-12 CN disclosed
CN-101687698-B Glass fiber sizing agent containing amphoteric polymer compound NITTO BOSEKI CO LTD 2012-08-01 CN disclosed
CN-102533220-A Polishing composition for magnetic disk substrate KAO CORP 2012-07-04 CN disclosed
US-20120156968-A1 POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE KAO CORPORATION (JP) 2012-06-21 US disclosed
CN-101735076-A Method for preparing high-purity cationic monomer diallyl ethylbenzylammonium chloride UNIV HUNAN SCI & TECHNOLOGY 2010-06-16 CN disclosed
CN-101735076-A Method for preparing high-purity cationic monomer diallyl ethylbenzylammonium chloride UNIV HUNAN SCI & TECHNOLOGY 2010-06-16 CN disclosed
CN-101735076-A Method for preparing high-purity cationic monomer diallyl ethylbenzylammonium chloride UNIV HUNAN SCI & TECHNOLOGY 2010-06-16 CN disclosed
CN-101687698-A Glass fiber sizing agent containing amphoteric polymer compound NITTO BOSEKI CO LTD 2010-03-31 CN disclosed