SCHEMBL9937877

SCHEMBL9937877

CCCCOC(=O)C(C)(F)F

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.52
ATM Q13315 1/20 0.48
ESR1 P03372 2/20 0.46
TSHR P16473 5/20 0.45
HPGD P15428 1/20 0.45
HCAR2 Q8TDS4 1/20 0.42
NAAA Q02083 1/20 0.42
CES2 O00748 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
RAD52 P43351 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
EPHX1 P07099 1/20 0.39
LMNA P02545 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
MAPK1 P28482 1/20 0.39
CYP2C19 P33261 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9938029 0.94 NAAA (0.50) ALDH1A1ATMTSHRHCAR2NAAA
SCHEMBL14198951 0.92 NAAA (0.53) ALDH1A1TSHRHCAR2NAAACES2
SCHEMBL19105204 0.87 ALDH1A1 (0.52) ALDH1A1ATMESR1TSHRHPGD
SCHEMBL16160733 0.87 ALDH1A1 (0.52) ALDH1A1ATMESR1TSHRHPGD
SCHEMBL2607867 0.86 HCAR2 (0.39) ALDH1A1ATMESR1TSHRHCAR2
SCHEMBL196154 0.84 ALDH1A1 (0.54) ALDH1A1ATMESR1TSHRHPGD
SCHEMBL1939682 0.83 ALDH1A1 (0.48) ALDH1A1ATMESR1TSHRHPGD
SCHEMBL2681694 0.83 ALDH1A1 (0.48) ALDH1A1ATMESR1TSHRHPGD
Ammonia Solution, Strong SCHEMBL27601992 0.83 ALDH1A1 (0.52) ALDH1A1ATMESR1TSHRHPGD
SCHEMBL28365281 0.82 FAAH (0.53) ALDH1A1NPSR1LMNACYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11916195-B2 Electrolyte solution, electrochemical device, lithium ion secondary battery, and module DAIKIN INDUSTRIES, LTD. (JP) 2024-02-27 US disclosed
US-11916195-B2 Electrolyte solution, electrochemical device, lithium ion secondary battery, and module DAIKIN INDUSTRIES, LTD. (JP) 2024-02-27 US disclosed
US-20210043974-A1 ELECTROLYTE SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY, AND MODULE DAIKIN INDUSTRIES, LTD. (JP) 2021-02-11 US disclosed
EP-3764451-A1 ELECTROLYTE SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY, AND MODULE DAIKIN INDUSTRIES, LTD. (JP) 2021-01-13 EP disclosed
US-9472813-B2 Battery electrolyte solution containing certain ester-based solvents, and batteries containing such an electrolyte solution DOW GLOBAL TECHNOLOGIES LLC (US) 2016-10-18 US disclosed
CN-103262329-B Battery electrolyte solution containing certain ester-based solvents and battery containing such electrolyte solution DOW GLOBAL TECHNOLOGIES LLC (US) 2016-02-10 CN disclosed
EP-2652832-A1 BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION Dow Global Technologies LLC (US) 2013-10-23 EP disclosed
US-20130260229-A1 BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION DOW GLOBAL TECHNOLOGIES LLC (US) 2013-10-03 US disclosed
CN-103262329-A Battery electrolyte solution containing certain ester-based solvents and battery containing such electrolyte solution DOW GLOBAL TECHNOLOGIES INC 2013-08-21 CN disclosed
WO-2012082760-A1 BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION DOW GLOBAL TECHNOLOGIES LLC (US) 2012-06-21 WO disclosed
US-8062830-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-22 US disclosed
US-20110189618-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-04 US disclosed
US-20110183264-A1 RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-28 US disclosed
US-20110171586-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-14 US disclosed
US-20110091820-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed
US-20110091818-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed