SCHEMBL9949870

SCHEMBL9949870

CCCCCCCN(C)[SiH](C)C

nearest known ligand 0.55

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 6/20 0.55
TSHR P16473 3/20 0.42
THRB P10828 1/20 0.42
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
S1PR2 O95136 1/20 0.38
S1PR1 P21453 1/20 0.38
S1PR3 Q99500 1/20 0.38
S1PR5 Q9H228 1/20 0.38
ALDH1A1 P00352 2/20 0.36
GBA1 P04062 1/20 0.35
GGPS1 O95749 3/20 0.35
MGLL Q99685 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11969339 1.00 DNM1 (0.55) DNM1TSHRTHRBCA12CA1
SCHEMBL10708510 1.00 DNM1 (0.55) DNM1TSHRTHRBCA12CA1
SCHEMBL9950028 1.00 DNM1 (0.55) DNM1TSHRTHRBCA12CA1
SCHEMBL11969290 1.00 DNM1 (0.55) DNM1TSHRTHRBCA12CA1
SCHEMBL9949599 0.97 DNM1 (0.50) DNM1TSHRTHRBCA12CA1
SCHEMBL1669083 0.76 DNM1 (0.50) DNM1TSHRTHRBCA12CA1
SCHEMBL23502354 0.71 DNM1 (0.67) DNM1TSHRTHRBS1PR2S1PR1
SCHEMBL24103978 0.71 DNM1 (0.67) DNM1TSHRTHRBS1PR2S1PR1
SCHEMBL9807727 0.71 DNM1 (1.00) DNM1TSHRTHRBCA12CA1
SCHEMBL25463105 0.71 DNM1 (0.67) DNM1TSHRTHRBS1PR2S1PR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US claimed
CN-103283004-A Wafer Cleaning Method CENTRAL GLASS CO LTD 2013-09-04 CN claimed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US claimed
US-20120164818-A1 Process for Cleaning Wafers CENTRAL GLASS COMPANY, LIMITED (JP) 2012-06-28 US claimed
CN-118974894-A Surface treatment composition and method for producing wafer 中央硝子株式会社 2024-11-15 CN disclosed
CN-107068540-A The cleaning method of chip 中央硝子株式会社 2017-08-18 CN disclosed
CN-103283004-B Wafer Cleaning Method 中央硝子株式会社 2017-04-12 CN disclosed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US disclosed
CN-103283004-A Wafer Cleaning Method CENTRAL GLASS CO LTD 2013-09-04 CN disclosed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US disclosed
US-20120164818-A1 Process for Cleaning Wafers CENTRAL GLASS COMPANY, LIMITED (JP) 2012-06-28 US disclosed