Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 6/20 | 0.55 |
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.38 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.38 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.38 |
| ▸ | S1PR5 | Q9H228 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | GBA1 | P04062 | 1/20 | 0.35 |
| ▸ | GGPS1 | O95749 | 3/20 | 0.35 |
| ▸ | MGLL | Q99685 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11969339 | 1.00 | DNM1 (0.55) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL10708510 | 1.00 | DNM1 (0.55) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL9949870 | 1.00 | DNM1 (0.55) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL11969290 | 1.00 | DNM1 (0.55) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL9949599 | 0.97 | DNM1 (0.50) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL1669083 | 0.76 | DNM1 (0.50) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL23502354 | 0.71 | DNM1 (0.67) | DNM1TSHRTHRBS1PR2S1PR1 | |
| SCHEMBL24103978 | 0.71 | DNM1 (0.67) | DNM1TSHRTHRBS1PR2S1PR1 | |
| SCHEMBL9807727 | 0.71 | DNM1 (1.00) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL25463105 | 0.71 | DNM1 (0.67) | DNM1TSHRTHRBS1PR2S1PR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8828144-B2 | Process for cleaning wafers | Central Grass Company, Limited (JP) | 2014-09-09 | — | — | US | claimed |
| US-20120211025-A1 | PROCESS FOR CLEANING WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-08-23 | — | — | US | claimed |
| US-20120164818-A1 | Process for Cleaning Wafers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-06-28 | — | — | US | claimed |
| CN-118974894-A | Surface treatment composition and method for producing wafer | 中央硝子株式会社 | 2024-11-15 | — | — | CN | disclosed |
| EP-3633711-B1 | SURFACE TREATMENT METHOD FOR IMPARTING ALCOHOL REPELLENCY TO SEMICONDUCTOR SUBSTRATE | MITSUBISHI GAS CHEMICAL CO (JP) | 2023-06-21 | — | — | EP | disclosed |
| US-11174399-B2 | Surface treatment method for imparting alcohol repellency to semiconductor substrate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-11-16 | — | — | US | disclosed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | disclosed |
| US-20200207993-A1 | SURFACE TREATMENT METHOD FOR IMPARTING ALCOHOL REPELLENCY TO SEMICONDUCTOR SUBSTRATE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-07-02 | — | — | US | disclosed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | disclosed |
| EP-3633711-A1 | SURFACE TREATMENT METHOD FOR IMPARTING ALCOHOL REPELLENCY TO SEMICONDUCTOR SUBSTRATE | Mitsubishi Gas Chemical Company, Inc. (JP) | 2020-04-08 | — | — | EP | disclosed |
| CN-110731004-A | Surface treatment method for imparting alcohol repellency to semiconductor substrate | 三菱瓦斯化学株式会社 | 2020-01-24 | — | — | CN | disclosed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | disclosed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | disclosed |
| US-8828144-B2 | Process for cleaning wafers | Central Grass Company, Limited (JP) | 2014-09-09 | — | — | US | disclosed |
| US-20130146100-A1 | Water Repellent Protective Film Forming Agent, Liquid Chemical for Forming Water Repellent Protective Film, and Wafer Cleaning Method Using Liquid Chemical | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20120211025-A1 | PROCESS FOR CLEANING WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120164818-A1 | Process for Cleaning Wafers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-06-28 | — | — | US | disclosed |