Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 4/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.34 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.34 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.34 |
| ▸ | S1PR5 | Q9H228 | 1/20 | 0.34 |
| ▸ | GGPS1 | O95749 | 4/20 | 0.32 |
| ▸ | GBA1 | P04062 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | FDPS | P14324 | 1/20 | 0.31 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.31 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.31 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.31 |
| ▸ | MGLL | Q99685 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11969339 | 0.97 | DNM1 (0.55) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL11969290 | 0.97 | DNM1 (0.55) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL9949870 | 0.97 | DNM1 (0.55) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL10708510 | 0.97 | DNM1 (0.55) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL9950028 | 0.97 | DNM1 (0.55) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL1669083 | 0.72 | DNM1 (0.50) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL71563 | 0.69 | — | — | |
| SCHEMBL16790931 | 0.69 | DNM1 (0.61) | DNM1TSHRTHRBS1PR2S1PR1 | |
| SCHEMBL28177060 | 0.69 | DNM1 (0.93) | DNM1TSHRTHRBCA12CA1 | |
| SCHEMBL516480 | 0.69 | DNM1 (0.61) | DNM1TSHRTHRBS1PR2S1PR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8828144-B2 | Process for cleaning wafers | Central Grass Company, Limited (JP) | 2014-09-09 | — | — | US | claimed |
| CN-103283004-A | Wafer Cleaning Method | CENTRAL GLASS CO LTD | 2013-09-04 | — | — | CN | claimed |
| US-20120211025-A1 | PROCESS FOR CLEANING WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-08-23 | — | — | US | claimed |
| US-20120164818-A1 | Process for Cleaning Wafers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-06-28 | — | — | US | claimed |
| US-12588446-B2 | Surface treatment composition and method for producing wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20250210375-A1 | SURFACE TREATMENT COMPOSITION AND METHOD FOR PRODUCING WAFER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-06-26 | — | — | US | disclosed |
| EP-4510171-A1 | SURFACE TREATMENT COMPOSITION AND METHOD FOR PRODUCING WAFER | Central Glass Company, Limited (JP) | 2025-02-19 | — | — | EP | disclosed |
| US-12203021-B2 | Substrate processing device and etching liquid | TOKYO ELECTRON LIMITED (JP) | 2025-01-21 | — | — | US | disclosed |
| CN-118974894-A | Surface treatment composition and method for producing wafer | 中央硝子株式会社 | 2024-11-15 | — | — | CN | disclosed |
| CN-111630639-B | Substrate processing method, substrate processing apparatus, and etching liquid | 东京毅力科创株式会社 | 2024-10-01 | — | — | CN | disclosed |
| US-20240038540-A1 | SURFACE TREATMENT COMPOSITION AND METHOD FOR PRODUCING WAFER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-01 | — | — | US | disclosed |
| EP-4299688-A1 | SURFACE TREATMENT COMPOSITION AND METHOD FOR PRODUCING WAFER | Central Glass Company, Limited (JP) | 2024-01-03 | — | — | EP | disclosed |
| CN-111630639-A | Substrate processing method, substrate processing apparatus, and etching solution | 东京毅力科创株式会社 | 2020-09-04 | — | — | CN | disclosed |
| CN-107068540-A | The cleaning method of chip | 中央硝子株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-103283004-B | Wafer Cleaning Method | 中央硝子株式会社 | 2017-04-12 | — | — | CN | disclosed |
| US-8828144-B2 | Process for cleaning wafers | Central Grass Company, Limited (JP) | 2014-09-09 | — | — | US | disclosed |
| CN-103283004-A | Wafer Cleaning Method | CENTRAL GLASS CO LTD | 2013-09-04 | — | — | CN | disclosed |
| US-20130146100-A1 | Water Repellent Protective Film Forming Agent, Liquid Chemical for Forming Water Repellent Protective Film, and Wafer Cleaning Method Using Liquid Chemical | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20120211025-A1 | PROCESS FOR CLEANING WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120164818-A1 | Process for Cleaning Wafers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-06-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12588446-B2 | Surface treatment composition and method for producing wafer | SGMS1, SGMS2, SMURF1 | DNM1 2940/4885TSHR 2614/4885THRB 2012/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.