SCHEMBL9950080

SCHEMBL9950080

CC1CCCC(CCc2cccc(C=O)c2)C1

nearest known ligand 0.36

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 2/20 0.36
DRD3 P35462 2/20 0.36
DRD1 P21728 1/20 0.36
DRD4 P21917 1/20 0.36
DRD5 P21918 1/20 0.36
MAOA P21397 3/20 0.35
MAOB P27338 3/20 0.35
OPRM1 P35372 3/20 0.35
OPRK1 P41145 3/20 0.35
OPRD1 P41143 2/20 0.35
SLC18A2 Q05940 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9950063 0.86 DRD2 (0.41) DRD2DRD3DRD1DRD4DRD5
SCHEMBL9950808 0.86 DRD2 (0.38) DRD2DRD3DRD1DRD4DRD5
SCHEMBL9950222 0.86 EED (0.39) DRD2DRD3DRD1DRD4DRD5
SCHEMBL9949810 0.85 MAOB (0.37) DRD2DRD3DRD1DRD4DRD5
SCHEMBL9949704 0.84 DAO (0.41) MAOAMAOBOPRM1OPRK1OPRD1
SCHEMBL9950007 0.83 SLC18A2 (0.33) SLC18A2
SCHEMBL16191818 0.82 HRH3 (0.48) OPRM1OPRK1OPRD1
SCHEMBL16191193 0.79 SLC18A2 (0.51) OPRM1OPRK1OPRD1SLC18A2
SCHEMBL9949517 0.79 DRD2 (0.40) DRD2DRD3DRD1DRD4DRD5
SCHEMBL9949875 0.79 DRD2 (0.38) DRD2DRD3DRD1DRD4DRD5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
CN-102596874-A Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern MITSUBISHI GAS CHEMICAL CO 2012-07-18 CN disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 DRD2 2661/4885DRD3 2822/4885DRD1 1092/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.