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Ethylene

Ethylene

SCHEMBL9950335

C=C.CCC1CCC(CCc2ccccc2C=O)CC1.CCOC(C)OCC

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL9950907 0.93 HRH3 (0.31) —
Ethylene SCHEMBL9949690 0.92 ALDH1A1 (0.30) —
Ethylene SCHEMBL9950628 0.91 SRC (0.37) —
Ethylene SCHEMBL9951035 0.90 SRC (0.31) —
Ethylene SCHEMBL9950804 0.88 HTR1A (0.33) —
SCHEMBL9950261 0.86 MEN1 (0.36) —
Ethylene SCHEMBL9951428 0.85 SRC (0.31) —
Ethylene SCHEMBL9949430 0.84 SRC (0.30) —
Ethylene SCHEMBL9950965 0.84 SLC18A2 (0.30) —
Ethylene SCHEMBL9949868 0.84 CEL (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 — — US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 — — EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 — — US disclosed