SCHEMBL9950337

SCHEMBL9950337

CCC1CCC(CCc2ccccc2C2OCCO2)CC1

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MAOA P21397 1/20 0.32
MAOB P27338 1/20 0.32
OPRL1 P41146 2/20 0.32
SLC6A4 P31645 2/20 0.32
RAB9A P51151 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
RIPK1 Q13546 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9950909 0.91 HRH3 (0.36) MAOAMAOBOPRL1SLC6A4RAB9A
SCHEMBL9949694 0.88 HRH1 (0.34) MAOAMAOBOPRL1SLC6A4RAB9A
SCHEMBL9951037 0.86 SLC18A2 (0.32) RAB9AL3MBTL1
SCHEMBL9950806 0.85 CNR1 (0.31) SLC6A4
SCHEMBL9950630 0.85 CEL (0.43) MAOAMAOBRAB9AL3MBTL1
SCHEMBL9951431 0.81 CHRNA7 (0.33) RAB9AL3MBTL1
SCHEMBL9950969 0.80 HTR2A (0.31)
SCHEMBL9950556 0.79 HRH3 (0.33) OPRL1SLC6A4RAB9AL3MBTL1
SCHEMBL9949432 0.78 SLC18A2 (0.32) RAB9AL3MBTL1
SCHEMBL9949829 0.77 CA1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 MAOA 4597/4885MAOB 4132/4885OPRL1 3413/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.