SCHEMBL9950512

SCHEMBL9950512

CCCC1CCCCC1C(C)c1ccc(C=O)cc1

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TYR P14679 1/20 0.41
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA4 P22748 1/20 0.37
PTGS1 P23219 7/20 0.35
PTGS2 P35354 6/20 0.35
MT-CO1 P00395 1/20 0.35
MT-CO2 P00403 1/20 0.35
GRIA4 P48058 1/20 0.35
ALDH1A3 P47895 2/20 0.33
ALDH1A1 P00352 1/20 0.33
ALDH3A1 P30838 1/20 0.33
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
LMNA P02545 1/20 0.30
CYP2A6 P11509 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL9950607 0.89 TYR (0.33) TYRCA1CA2CA4PTGS1
SCHEMBL9949424 0.89 TYR (0.43) TYRPTGS1PTGS2MT-CO1MT-CO2
SCHEMBL9949814 0.84 DRD2 (0.39) CA1CA2CA4ALDH1A1
Ethylene SCHEMBL9949580 0.79 TYR (0.35) TYRPTGS1PTGS2MT-CO1MT-CO2
SCHEMBL9950062 0.78 TYR (0.47) TYRGRIA4ALDH1A3ALDH1A1NPC1
Ethylene SCHEMBL9949944 0.76 DRD2 (0.33) CA1CA2CA4
SCHEMBL9949675 0.74 TYR (0.43) TYRGRIA4ALDH1A3ALDH1A1ALDH3A1
SCHEMBL9949776 0.74 TYR (0.40) TYRGRIA4ALDH1A3ALDH1A1ALDH3A1
SCHEMBL9950514 0.74 CA1 (0.37) CA1CA2CA4ALDH1A3ALDH1A1
SCHEMBL9950500 0.74 PTGS1 (0.38) CA1CA2CA4PTGS1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP claimed
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP disclosed
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 TYR 4864/4885CA1 1807/4885CA2 4834/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.