Ethylene

Ethylene

SCHEMBL9951072

C=C.CC1CCCCC1Cc1ccccc1C=O.CCOC(C)OCC

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL9950825 0.90 SRC (0.30)
Ethylene SCHEMBL9950919 0.89
Ethylene SCHEMBL9950208 0.88 CA1 (0.30)
SCHEMBL9950266 0.85 LMNA (0.36)
Ethylene SCHEMBL9949388 0.85 SRC (0.38)
Ethylene SCHEMBL9950383 0.81 HTR1A (0.32)
Ethylene SCHEMBL9950965 0.81 SLC18A2 (0.30)
Ethylene SCHEMBL9950785 0.81 SRC (0.31)
Ethylene SCHEMBL9949827 0.81 SLC18A2 (0.30)
Ethylene SCHEMBL9950804 0.80 HTR1A (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed