Ethylene

Ethylene

SCHEMBL9949388

C=C.CCOC(C)OCC.O=Cc1ccccc1CC1CCCCC1

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SRC P12931 1/20 0.38
TDP1 Q9NUW8 2/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
KLK7 P49862 1/20 0.33
PPARG P37231 1/20 0.32
PPARA Q07869 1/20 0.32
FFAR1 O14842 1/20 0.32
CTSL P07711 1/20 0.32
TSHR P16473 1/20 0.32
KMT2A Q03164 3/20 0.32
CEL P19835 1/20 0.32
NPSR1 Q6W5P4 2/20 0.31
ALDH1A1 P00352 1/20 0.31
PLA2G1B P04054 1/20 0.31
ATG4B Q9Y4P1 1/20 0.31
MEN1 O00255 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL9950804 0.90 HTR1A (0.33)
Ethylene SCHEMBL9950192 0.90 SRC (0.32) SRC
Ethylene SCHEMBL9950383 0.89 HTR1A (0.32)
Ethylene SCHEMBL9950785 0.89 SRC (0.31) SRC
Ethylene SCHEMBL9950628 0.88 SRC (0.37) SRCTDP1KLK7PPARGPPARA
Ethylene SCHEMBL9950554 0.88 HTR1A (0.32)
Ethylene SCHEMBL9950727 0.88 SRC (0.31) SRC
Ethylene SCHEMBL9949868 0.86 CEL (0.37) SRCCEL
Ethylene SCHEMBL9950825 0.86 SRC (0.30) SRC
Ethylene SCHEMBL9950871 0.85 CYSLTR2 (0.40) SRCCEL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 SRC 3498/4885TDP1 941/4885L3MBTL1 358/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.