SCHEMBL9963679

SCHEMBL9963679

C=Cc1ccc2cc(OS(=O)(=O)CCCOc3c(F)c(F)c(S(=O)(=O)O)c(F)c3F)ccc2c1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2742171 0.85 TDP1 (0.37) TDP1
SCHEMBL14838098 0.80 TDP1 (0.41) TDP1
SCHEMBL9963760 0.80 ALDH1A1 (0.36) TDP1
SCHEMBL9966127 0.76 — —
SCHEMBL15189382 0.73 TDP1 (0.46) TDP1
SCHEMBL2742174 0.72 TDP1 (0.38) TDP1
SCHEMBL16683010 0.71 TDP1 (0.44) TDP1
SCHEMBL2742186 0.70 TDP1 (0.42) TDP1
SCHEMBL16590874 0.68 TDP1 (0.36) TDP1
SCHEMBL14278399 0.67 CA1 (0.38) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9052590-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-06-09 — — US disclosed
US-20120156618-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-06-21 — — US disclosed
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