SCHEMBL9965802

SCHEMBL9965802

CSCCNCc1ccccc1

nearest known ligand 0.64

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.64
KMT2A Q03164 1/20 0.64
TDP1 Q9NUW8 1/20 0.64
MAOA P21397 1/20 0.57
MAPT P10636 2/20 0.55
CHRM2 P08172 1/20 0.55
GAA P10253 1/20 0.55
SIGMAR1 Q99720 3/20 0.52
VEGFA P15692 1/20 0.50
EGLN1 Q9GZT9 1/20 0.50
DRD4 P21917 1/20 0.48
MPO P05164 1/20 0.46
DPP7 Q9UHL4 1/20 0.46
KDM4E B2RXH2 1/20 0.45
CYP3A4 P08684 1/20 0.45
SCN8A Q9UQD0 1/20 0.45
HRH4 Q9H3N8 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL4349681 0.98 MEN1 (0.61) MEN1KMT2ATDP1MAOAMAPT
SCHEMBL15416880 0.89 SMN1; SMN2 (0.56) MEN1KMT2ATDP1MAOAMAPT
SCHEMBL8498074 0.84 LTA4H (0.57) MEN1KMT2ATDP1GAADRD4
SCHEMBL11370850 0.83 MEN1 (0.70) MEN1KMT2ATDP1MAOAMAPT
SCHEMBL20695802 0.81 CHRM2 (0.50) CHRM2VEGFAEGLN1MPOKDM4E
SCHEMBL13127773 0.80 CHRM2 (0.40) MEN1KMT2ATDP1CHRM2GAA
SCHEMBL8252494 0.80 SMN1; SMN2 (0.52) GAAKDM4ECYP3A4
SCHEMBL9993261 0.80 MEN1 (0.59) MEN1KMT2ATDP1MAOAMAPT
Hydrochloric Acid SCHEMBL6898327 0.80 SIGMAR1 (0.57) MAPTGAASIGMAR1DRD4CYP3A4
SCHEMBL5764 0.79 MEN1 (1.00) MEN1KMT2ATDP1MAOAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
EP-1496053-B1 Kappa-opioid receptor agonist comprising a 2-phenylbenzothiazoline derivative SANTEN PHARMACEUTICAL CO LTD (JP) 2012-06-20 EP disclosed
EP-2042173-A2 Kappa-opioid receptor agonist comprising 2-phenylbenzothiazoline derivative SANTEN PHARMACEUTICAL CO., LTD. (JP) 2009-04-01 EP disclosed
US-7410987-B2 Method for treating pain or pruritis by administering κ-opioid receptor agonist comprising 2-phenylbenzothiazoline derivative SANTEN PHARMACEUTICAL CO., LTD. (JP) 2008-08-12 US disclosed
US-7410987-B2 Method for treating pain or pruritis by administering κ-opioid receptor agonist comprising 2-phenylbenzothiazoline derivative SANTEN PHARMACEUTICAL CO., LTD. (JP) 2008-08-12 US disclosed