SCHEMBL9965802

SCHEMBL9965802

CSCCNCc1ccccc1

nearest known ligand 0.64

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 1/20 0.64
▸ KMT2A Q03164 1/20 0.64
▸ TDP1 Q9NUW8 1/20 0.64
▸ MAOA P21397 1/20 0.57
▸ MAPT P10636 2/20 0.55
▸ CHRM2 P08172 1/20 0.55
▸ GAA P10253 1/20 0.55
▸ SIGMAR1 Q99720 3/20 0.52
▸ VEGFA P15692 1/20 0.50
▸ EGLN1 Q9GZT9 1/20 0.50
▸ DRD4 P21917 1/20 0.48
▸ MPO P05164 1/20 0.46
▸ DPP7 Q9UHL4 1/20 0.46
▸ KDM4E B2RXH2 1/20 0.45
▸ CYP3A4 P08684 1/20 0.45
▸ SCN8A Q9UQD0 1/20 0.45
▸ HRH4 Q9H3N8 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL4349681 0.98 MEN1 (0.61) MEN1KMT2ATDP1MAOAMAPT
SCHEMBL15416880 0.89 SMN1; SMN2 (0.56) MEN1KMT2ATDP1MAOAMAPT
SCHEMBL8498074 0.84 LTA4H (0.57) MEN1KMT2ATDP1GAADRD4
SCHEMBL11370850 0.83 MEN1 (0.70) MEN1KMT2ATDP1MAOAMAPT
SCHEMBL20695802 0.81 CHRM2 (0.50) CHRM2VEGFAEGLN1MPOKDM4E
SCHEMBL8252494 0.80 SMN1; SMN2 (0.52) GAAKDM4ECYP3A4
SCHEMBL13127773 0.80 CHRM2 (0.40) MEN1KMT2ATDP1CHRM2GAA
Hydrochloric Acid SCHEMBL6898327 0.80 SIGMAR1 (0.57) MAPTGAASIGMAR1DRD4CYP3A4
SCHEMBL9993261 0.80 MEN1 (0.59) MEN1KMT2ATDP1MAOAMAPT
SCHEMBL5764 0.79 MEN1 (1.00) MEN1KMT2ATDP1MAOAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
EP-1496053-B1 Kappa-opioid receptor agonist comprising a 2-phenylbenzothiazoline derivative SANTEN PHARMACEUTICAL CO LTD (JP) 2012-06-20 — — EP disclosed
EP-2042173-A2 Kappa-opioid receptor agonist comprising 2-phenylbenzothiazoline derivative SANTEN PHARMACEUTICAL CO., LTD. (JP) 2009-04-01 — — EP disclosed
US-7410987-B2 Method for treating pain or pruritis by administering κ-opioid receptor agonist comprising 2-phenylbenzothiazoline derivative SANTEN PHARMACEUTICAL CO., LTD. (JP) 2008-08-12 — — US disclosed
US-7410987-B2 Method for treating pain or pruritis by administering κ-opioid receptor agonist comprising 2-phenylbenzothiazoline derivative SANTEN PHARMACEUTICAL CO., LTD. (JP) 2008-08-12 — — US disclosed
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