SCHEMBL9967357

SCHEMBL9967357

CC(=O)c1ccc(N2C(=O)c3ccc(C#Cc4ccccc4)cc3C2=O)cc1

nearest known ligand 0.55

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA9 Q16790 7/20 0.51
CA1 P00915 5/20 0.51
CA12 O43570 5/20 0.51
CA2 P00918 2/20 0.51
SCN2A Q99250 1/20 0.51
CA4 P22748 2/20 0.51
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
GFER P55789 1/20 0.50
POLB P06746 1/20 0.48
ALDH1A1 P00352 2/20 0.47
ESR1 P03372 1/20 0.47
MET P08581 1/20 0.47
CTDSP1 Q9GZU7 1/20 0.46
NPSR1 Q6W5P4 2/20 0.46
MAPT P10636 1/20 0.46
PPARA Q07869 1/20 0.45
CA7 P43166 1/20 0.45
HSD17B10 Q99714 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13900300 0.90 CA9 (0.66) CA9CA1CA12CA2SCN2A
SCHEMBL29637688 0.90 CA9 (0.66) CA9CA1CA12CA2SCN2A
SCHEMBL16927161 0.88 GRM5 (0.54) CA9CA1CA12CA2SCN2A
SCHEMBL15081236 0.87 CA9 (0.51) CA9CA1CA12CA2SCN2A
SCHEMBL20716046 0.85 ALDH1A1 (0.55) CA9CA1CA12CA2MEN1
SCHEMBL7678431 0.85 ESR1 (0.58) CA9CA1CA12CA2SCN2A
SCHEMBL19411347 0.84 HSD17B10 (0.53) MEN1KMT2APOLBALDH1A1ESR1
SCHEMBL2625350 0.84 GRM5 (0.48) CA9CA1CA12CA2SCN2A
SCHEMBL2471106 0.84 ESR1 (0.63) CA9CA1CA12CA2SCN2A
SCHEMBL13132630 0.82 CA1 (0.50) CA9CA1CA12CA2SCN2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023559-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2015-05-05 US disclosed
US-8841064-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-09-23 US disclosed
US-8815489-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-08-26 US disclosed
US-8785103-B2 Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-07-22 US disclosed
US-20130171563-A1 Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2013-07-04 US disclosed
US-20130137036-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2013-05-30 US disclosed
US-8420287-B2 Positive photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2013-04-16 US disclosed
US-20120171610-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2012-07-05 US disclosed
US-20120171614-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2012-07-05 US disclosed
US-20120171609-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Layer Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Layer CHEIL INDUSTRIES INC. (KR) 2012-07-05 US disclosed
US-20120156614-A1 Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-06-21 US disclosed
US-20110111346-A1 Positive Photosensitive Resin Composition CHEIL INDUSTRIES INC. (KR) 2011-05-12 US disclosed
US-7507784-B2 Liquid crystalline thermosets from ester, ester-imide, and ester-amide oligomers THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) 2009-03-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120156614-A1 Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same SUN2, TYR, PSMD2 CA9 1444/4885CA1 4119/4885CA12 3524/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.