SCHEMBL9970255

SCHEMBL9970255

O=C(O)c1cc2cc3c(cc2[nH]1)NCC3

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR35 Q9HC97 1/20 0.51
SMAD3 P84022 1/20 0.45
KDM4E B2RXH2 4/20 0.44
HPGD P15428 3/20 0.44
HSD17B10 Q99714 3/20 0.44
ALDH1A1 P00352 2/20 0.44
F7 P08709 1/20 0.44
F3 P13726 1/20 0.44
PIN1 Q13526 1/20 0.44
PDPK1 O15530 1/20 0.44
LMNA P02545 1/20 0.44
TSHR P16473 1/20 0.44
NFKB1 P19838 1/20 0.44
APEX1 P27695 1/20 0.44
CYP2C19 P33261 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
SRD5A2 P31213 3/20 0.44
MAPT P10636 2/20 0.44
DAO P14920 2/20 0.44
EIF4A3 P38919 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29101153 0.77 GPR35 (0.48) GPR35SMAD3KDM4EHPGDHSD17B10
SCHEMBL13954896 0.72 DRD2 (0.44) KDM4EHPGDHSD17B10ALDH1A1F7
SCHEMBL29461453 0.72 GPR35 (0.66) GPR35SMAD3KDM4EHPGDHSD17B10
SCHEMBL28706307 0.72 GPR35 (0.66) GPR35SMAD3KDM4EHPGDHSD17B10
SCHEMBL17490826 0.70 DRD2 (0.46) KDM4EHPGDHSD17B10ALDH1A1TSHR
SCHEMBL13072345 0.70 AR (0.38) ALDH1A1MAPTARDRD2DRD4
SCHEMBL13955138 0.69 MAPT (0.45) KDM4EHPGDHSD17B10ALDH1A1TSHR
SCHEMBL49512 0.69 GPR35 (1.00) GPR35SMAD3KDM4EHPGDHSD17B10
SCHEMBL4822486 0.68 PIM1 (0.43) KDM4EHPGDHSD17B10ALDH1A1LMNA
SCHEMBL4294423 0.68 KDM4E (0.48) GPR35SMAD3KDM4EHPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8202445-B2 Metal polishing composition and chemical mechanical polishing method FUJIFILM CORPORATION (JP) 2012-06-19 US disclosed
US-8202445-B2 Metal polishing composition and chemical mechanical polishing method FUJIFILM CORPORATION (JP) 2012-06-19 US disclosed
US-20090246956-A1 METAL POLISHING COMPOSITION AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-20090246956-A1 METAL POLISHING COMPOSITION AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed