SCHEMBL9975579

SCHEMBL9975579

C=CC(=O)OC1C2CC3CC(=O)OC1C3C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13898924 0.82 TAS2R46 (0.33)
SCHEMBL1704883 0.82 SMN1; SMN2 (0.31)
SCHEMBL448688 0.81 KDM4E (0.33)
SCHEMBL10135165 0.81
SCHEMBL14531660 0.79
SCHEMBL10134648 0.79
SCHEMBL415325 0.78
SCHEMBL9975638 0.78
SCHEMBL22399918 0.78
SCHEMBL14549206 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed
WO-2013023124-A2 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 WO disclosed
US-8202678-B2 Wet developable bottom antireflective coating composition and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-06-19 US disclosed
US-8202678-B2 Wet developable bottom antireflective coating composition and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-06-19 US disclosed
US-20090291392-A1 WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-11-26 US disclosed
US-20090291392-A1 WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-11-26 US disclosed
US-7563563-B2 Wet developable bottom antireflective coating composition and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-21 US disclosed
US-7563563-B2 Wet developable bottom antireflective coating composition and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-21 US disclosed
WO-2007121456-A2 WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-10-25 WO disclosed
US-20070243484-A1 Wet developable bottom antireflective coating composition and method for use thereof GLOBALFOUNDRIES U.S. INC. 2007-10-18 US disclosed
US-20070243484-A1 Wet developable bottom antireflective coating composition and method for use thereof GLOBALFOUNDRIES U.S. INC. 2007-10-18 US disclosed
US-20070231736-A1 Bottom antireflective coating composition and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION 2007-10-04 US disclosed
US-20070231736-A1 Bottom antireflective coating composition and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION 2007-10-04 US disclosed
EP-1790645-A1 LACTONE COMPOUND, LACTONE-CONTAINING MONOMER, POLYMER OF THOSE, RESIST COMPOSITION USING SAME, METHOD FOR FORMING PATTERN USING SAME Central Glass Company, Limited (JP) 2007-05-30 EP disclosed