SCHEMBL9980574

SCHEMBL9980574

CC(=O)C(F)c1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SRC P12931 2/20 0.46
CYP2D6 P10635 1/20 0.46
HPGD P15428 1/20 0.45
LMNA P02545 2/20 0.44
MAPK1 P28482 1/20 0.44
KMT2A Q03164 1/20 0.43
CES2 O00748 1/20 0.43
CES1 P23141 1/20 0.43
KEAP1 Q14145 2/20 0.42
NFE2L2 Q16236 2/20 0.42
MTNR1A P48039 1/20 0.42
MTNR1B P49286 1/20 0.42
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ALDH1A1 P00352 1/20 0.41
CYP3A4 P08684 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13626301 1.00 SRC (0.46) SRCCYP2D6HPGDLMNAMAPK1
SCHEMBL3336638 0.87 PTGS2 (0.55) L3MBTL1
SCHEMBL241909 0.80 SRC (0.56) SRCCYP2D6LMNAMAPK1CES2
SCHEMBL28232530 0.80 SRC (0.56) SRCCYP2D6LMNAMAPK1CES2
SCHEMBL9394507 0.80 SRC (0.50) SRCCYP2D6LMNAMAPK1KMT2A
SCHEMBL28232476 0.80 SRC (0.56) SRCCYP2D6LMNAMAPK1CES2
SCHEMBL1100039 0.80 TRPA1 (0.42) SRCCYP2D6HPGDLMNAKEAP1
SCHEMBL6969665 0.78 SRC (0.48) SRCCYP2D6LMNAMAPK1KMT2A
SCHEMBL11183816 0.78 SRC (0.48) SRCCYP2D6LMNAMAPK1KMT2A
SCHEMBL28307635 0.78 SRC (0.54) SRCCYP2D6LMNAMAPK1CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114094098-A Metal lithium powder composite material, preparation method, silica cathode and lithium ion battery 上海卡耐新能源有限公司 2022-02-25 CN claimed
CN-107445880-B A kind of trifluoromethyl modification AβThe synthetic method of -42 inhibitor structure analogs 华南理工大学 2019-07-16 CN claimed
CN-109810573-A Inorganic nano material prints ink and its preparation method and application TCL集团股份有限公司 2019-05-28 CN claimed
CN-107445880-A A kind of trifluoromethyl modifies AβThe synthetic method of 42 inhibitor structure analogs 华南理工大学 2017-12-08 CN claimed
CN-104803951-A Method for preparing high-quality epoxy cyclohexane by adopting micro-flow field reaction technology NANJING UNIVERSITY OF TECHNOLOGY 2015-07-29 CN claimed
CN-104710256-A Cheap and efficient synthesis method of alpha-hydroxyketone compound UNIV BEIJING 2015-06-17 CN claimed
CN-101891569-B Preparation method of alpha-aromatic ketone compound UNIV WUHAN 2013-07-24 CN claimed
CN-119040289-A Amine dehydrogenase and encoding nucleic acid and application thereof 河北工业大学 2024-11-29 CN disclosed
US-12084462-B2 Spiro bicyclic inhibitors of menin-MLL interaction JANSSEN PHARMACEUTICA NV (BE) 2024-09-10 US disclosed
CN-112218844-B Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method 三菱瓦斯化学株式会社 2024-04-26 CN disclosed
CN-115968391-B Composition, resin, method for producing amorphous film, method for forming resist pattern, method for producing underlayer film for lithography, and method for forming circuit pattern 三菱瓦斯化学株式会社 2024-04-26 CN disclosed
US-20240117102-A1 POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-04-11 US disclosed
US-20240117101-A1 COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, COMPOSITION FOR OPTICAL MEMBER FORMATION, RESIN FOR UNDERLAYER FILM FORMATION, RESIST RESIN, RADIATION-SENSITIVE RESIN, AND RESIN FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-04-11 US disclosed
US-8383094-B2 inhibit the function of the NS5A protein encoded by Hepatitis C virus (HCV); useful in establishing or determining the binding site of other antiviral compounds, for example, by competitive inhibition; used to treat or prevent viral contamination of materials BRISTOL-MYERS SQUIBB COMPANY (US) 2013-02-26 US disclosed
CN-102933555-A Pyrazolecarboxamide derivatives and their use as microbiocides SYNGENTA PARTICIPATIONS AG 2013-02-13 CN disclosed
CN-101367715-B Synthesis of substituted methyl benzylketone YIYUAN XINQUAN CHEMICAL CO LTD 2012-09-05 CN disclosed
WO-2011147690-A1 PYRAZOLECARBOXAMIDE DERIVATIVES AND THEIR USE AS MICROBIOCIDES SYNGENTA PARTICIPATIONS AG (CH) 2011-12-01 WO disclosed
CN-101367715-A Synthesis of substituted methyl benzylketone YIYUAN XINQUAN CHEMICAL CO LTD (CN) 2009-02-18 CN disclosed
CN-101134739-A Novel beta-lactam compound and preparation method and chemical uses thereof CHANGCHUN DISCOVERY SCIENCES L (CN) 2008-03-05 CN disclosed
US-4215044-A FLUORINATION OF AN UNSATURATED SILANOL COMPOUND WITH A PERHALOGENATED HYPOFLUORITE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1980-07-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12084462-B2 Spiro bicyclic inhibitors of menin-MLL interaction BMI1, MLLT1, MEN1 SRC 2402/4885CYP2D6 3831/4885HPGD 1558/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.