SCHEMBL998061

SCHEMBL998061

C=C(C)C(=O)Oc1c(O)ccc2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.42
PTPN22 Q9Y2R2 1/20 0.42
KDM4E B2RXH2 3/20 0.41
ALDH1A1 P00352 3/20 0.41
HSD17B10 Q99714 3/20 0.41
GAA P10253 3/20 0.41
HPGD P15428 2/20 0.41
GLA P06280 1/20 0.41
G6PD P11413 1/20 0.40
ERN1 O75460 1/20 0.40
POLB P06746 2/20 0.40
HCRTR1 O43613 1/20 0.39
MAPT P10636 3/20 0.39
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
TP53 P04637 1/20 0.39
HTT P42858 1/20 0.39
USP2 O75604 1/20 0.39
PAK1 Q13153 1/20 0.39
CYP1A2 P05177 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8723116 0.86 NCEH1 (0.46) ELANEALDH1A1HSD17B10GAAMAPT
SCHEMBL819579 0.84 MAPT (0.42) ELANEKDM4EALDH1A1HSD17B10GAA
SCHEMBL10040401 0.83 PTPN22 (0.47) PTPN22KDM4EALDH1A1HSD17B10GAA
SCHEMBL5675873 0.83 KDM4E (0.54) PTPN22KDM4EALDH1A1HSD17B10GAA
SCHEMBL13588230 0.83 HPGD (0.42) ELANEKDM4EALDH1A1GAAHPGD
SCHEMBL417333 0.82 ELANE (0.45) ELANEKDM4EALDH1A1HSD17B10GAA
SCHEMBL29733218 0.82 NCEH1 (0.42) ELANEALDH1A1HPGDMAPTNCEH1
SCHEMBL30226953 0.82 NCEH1 (0.44) ELANEKDM4EALDH1A1HSD17B10GAA
SCHEMBL11982347 0.82 WDR5 (0.50) ELANEKDM4EALDH1A1HSD17B10HPGD
SCHEMBL9075317 0.81 CA1 (0.44) ELANEKDM4EALDH1A1HSD17B10GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9164383-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-20 US claimed
US-9091914-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-28 US claimed
US-10040947-B2 Primer composition MITSUI CHEMICALS, INC. (JP) 2018-08-07 US disclosed
US-20180163056-A1 HYDROPHILIC CURABLE COMPOSITIONS MITSUI CHEMICALS, INC. (JP) 2018-06-14 US disclosed
US-20180036995-A1 HYDROPHILIC MONOLAYER FILM WITH OPTICAL FUNCTIONALITY AND STACK OF THE SAME MITSUI CHEMICALS, INC. (JP) 2018-02-08 US disclosed
EP-3270192-A1 HYDROPHILIC SINGLE-LAYER FILM HAVING OPTICAL FUNCTIONALITY, AND LAMINATE THEREOF Mitsui Chemicals, Inc. (JP) 2018-01-17 EP disclosed
US-20170209345-A1 DENTAL PROSTHESIS MITSUI CHEMICALS, INC. (JP) 2017-07-27 US disclosed
US-9685597-B2 Curable composition for sealing optical semiconductor DAICEL CORPORATION (JP) 2017-06-20 US disclosed
US-9551932-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-24 US disclosed
US-9551928-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith FUJIFILM CORPORATION (JP) 2017-01-24 US disclosed
US-9551932-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-24 US disclosed
US-20090226843-A1 MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-10 US disclosed
US-20090226843-A1 MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-10 US disclosed
US-20090191373-A1 Single Layer Film and Hydrophilic Material Comprising the Same MITSUI CHEMICALS ,INC. 2009-07-30 US disclosed
US-20090087786-A1 PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-04-02 US disclosed
US-20090087786-A1 PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-04-02 US disclosed
EP-1955782-A1 SINGLE LAYER FILM AND HYDROPHILIC MATERIAL COMPOSED OF SAME Mitsui Chemicals, Inc. (JP) 2008-08-13 EP disclosed
EP-0184800-B1 OXYGEN PERMEABLE SOFT CONTACT LENS MATERIAL Toyo Contact Lens Co., Ltd. (JP) 1992-04-29 EP disclosed
US-4649184-A UNSATURATED POLYSILOXANE COPOLYMER WITH MONOMER HAVING SIYLATED HYDROXYL GROUPS TOYO CONTACT LENS CO., LTD. (JP) 1987-03-10 US disclosed
EP-0184800-A2 Oxygen permeable soft contact lens material Toyo Contact Lens Co., Ltd. (JP) 1986-06-18 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170209345-A1 DENTAL PROSTHESIS CAD, OR10J3, PSMA3 ELANE 3670/4885PTPN22 3357/4885KDM4E 1808/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.