Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.58 |
| ▸ | LMNA | P02545 | 3/20 | 0.58 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.52 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.50 |
| ▸ | CES2 | O00748 | 1/20 | 0.46 |
| ▸ | CES1 | P23141 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 4/20 | 0.46 |
| ▸ | GAA | P10253 | 2/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | COMT | P21964 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 3/20 | 0.42 |
| ▸ | PKM | P14618 | 2/20 | 0.42 |
| ▸ | ATM | Q13315 | 2/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | NTSR1 | P30989 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11947075 | 0.92 | ALDH1A1 (0.68) | ALDH1A1LMNAAKR1C3SRD5A2CES2 | |
| SCHEMBL28432848 | 0.85 | ALDH1A1 (0.52) | ALDH1A1LMNAAKR1C3SRD5A2CES2 | |
| SCHEMBL12792099 | 0.84 | AKR1C3 (0.67) | ALDH1A1LMNAAKR1C3SRD5A2CES2 | |
| SCHEMBL109891 | 0.84 | ALDH1A1 (0.50) | ALDH1A1LMNAAKR1C3SRD5A2CES2 | |
| SCHEMBL30007458 | 0.84 | ALDH1A1 (0.50) | ALDH1A1LMNAAKR1C3SRD5A2CES2 | |
| SCHEMBL22580864 | 0.83 | SMN1; SMN2 (0.62) | ALDH1A1LMNACES2CES1MAPT | |
| SCHEMBL28946122 | 0.83 | SRD5A2 (0.51) | ALDH1A1SRD5A2MAPTSMN1; SMN2TDP1 | |
| SCHEMBL8732527 | 0.83 | TDP2 (0.36) | ALDH1A1LMNAAKR1C3MAPTGAA | |
| SCHEMBL11658935 | 0.82 | NFE2L2 (0.42) | ALDH1A1LMNASMN1; SMN2TDP1HTT | |
| SCHEMBL11613229 | 0.82 | AKR1C3 (0.59) | ALDH1A1LMNAAKR1C3SRD5A2CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8309280-B2 | Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device | SUMITOMO BAKELITE CO., LTD. (JP) | 2012-11-13 | — | — | US | disclosed |
| US-8269358-B2 | Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2012-09-18 | — | — | US | disclosed |
| US-8119833-B2 | Dendrimer solid acid and polymer electrolyte membrane including the same | SAMSUNG SDI CO., LTD. (KR) | 2012-02-21 | — | — | US | disclosed |
| US-8119833-B2 | Dendrimer solid acid and polymer electrolyte membrane including the same | SAMSUNG SDI CO., LTD. (KR) | 2012-02-21 | — | — | US | disclosed |
| US-8049033-B2 | Dendrimer solid acid and polymer electrolyte membrane including the same | SAMSUNG SDI CO., LTD. (KR) | 2011-11-01 | — | — | US | disclosed |
| US-8049033-B2 | Dendrimer solid acid and polymer electrolyte membrane including the same | SAMSUNG SDI CO., LTD. (KR) | 2011-11-01 | — | — | US | disclosed |
| US-20110262833-A1 | DENDRIMER SOLID ACID AND POLYMER ELECTROLYTE MEMBRANE INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2011-10-27 | — | — | US | disclosed |
| US-20110262833-A1 | DENDRIMER SOLID ACID AND POLYMER ELECTROLYTE MEMBRANE INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2011-10-27 | — | — | US | disclosed |
| US-7858721-B2 | Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films | PROMERUS LLC (US) | 2010-12-28 | — | — | US | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-7439005-B2 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7435526-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-7368205-B2 | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device | SUMITOMO BAKELITE CO., LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7361445-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY (JP) | 2008-04-22 | — | — | US | disclosed |
| US-7344821-B2 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2008-03-18 | — | — | US | disclosed |
| US-7238455-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2007-07-03 | — | — | US | disclosed |
| US-20070134586-A1 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070092779-A1 | Dendrimer solid acid and polymer electrolyte membrane including the same | SAMSUNG SDI CO., LTD. (KR) | 2007-04-26 | — | — | US | disclosed |
| US-20070092779-A1 | Dendrimer solid acid and polymer electrolyte membrane including the same | SAMSUNG SDI CO., LTD. (KR) | 2007-04-26 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |