Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | FPR1 | P21462 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6124091 | 1.00 | L3MBTL1 (0.42) | L3MBTL1TP53GAAKDM4ECYP1A2 | |
| SCHEMBL15033912 | 0.93 | L3MBTL1 (0.55) | L3MBTL1TP53GAA | |
| SCHEMBL12368490 | 0.93 | L3MBTL1 (0.55) | L3MBTL1TP53GAA | |
| SCHEMBL17807665 | 0.93 | L3MBTL1 (0.55) | L3MBTL1TP53GAA | |
| SCHEMBL16284292 | 0.93 | TP53 (0.44) | L3MBTL1TP53GAAADRA2C | |
| SCHEMBL15429213 | 0.89 | TP53 (0.47) | L3MBTL1TP53GAAADRA2C | |
| SCHEMBL75394 | 0.85 | L3MBTL1 (0.43) | L3MBTL1TP53GAAADRA2C | |
| SCHEMBL17877052 | 0.84 | L3MBTL1 (0.31) | L3MBTL1 | |
| SCHEMBL21414069 | 0.84 | L3MBTL1 (0.61) | L3MBTL1 | |
| SCHEMBL18106281 | 0.83 | L3MBTL1 (0.50) | L3MBTL1TP53GAAKDM4EADRA2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10042258-B2 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-08-07 | — | — | US | disclosed |
| US-20180210338-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-26 | — | — | US | disclosed |
| US-20180120701-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-20180087010-A1 | PRE-RINSING LIQUID, PRE-RINSING TREATMENT METHOD, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-03-29 | — | — | US | disclosed |
| US-9910005-B2 | Biosensor | STMICROELECTRONICS S.R.L. (IT) | 2018-03-06 | — | — | US | disclosed |
| US-20170351176-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-9823210-B2 | Method of manufacturing a biosensor | STMICROELECTRONICS S.R.L. (IT) | 2017-11-21 | — | — | US | disclosed |
| US-9746772-B2 | Resist underlayer film forming composition for lithography containing polyether structure-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-20170205711-A1 | COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| US-9696626-B2 | Composition for forming a resist underlayer film, and pattern-forming method | JSR CORPORATION (JP) | 2017-07-04 | — | — | US | disclosed |
| US-20120292487-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120181251-A1 | PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120052449-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120007200-A1 | Image Sensor and Method for Manufacturing the Same | CHEIL INDUSTRIES INC. (KR) | 2012-01-12 | — | — | US | disclosed |
| US-20110287234-A1 | NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2011-11-24 | — | — | US | disclosed |
| US-20110260114-A1 | SEMICONDUCTING COMPOSITION | XEROX CORPORATION (US) | 2011-10-27 | — | — | US | disclosed |
| US-20110086310-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCTION OF MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-04-14 | — | — | US | disclosed |
| US-20080305431-A1 | PRETREATMENT COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2008-12-11 | — | — | US | disclosed |
| US-7407731-B2 | of photosensitive polybenzoxazole (PBO) precursors, a mercapto compound of given formula such as 2-mercaptobenzoxazole to inhibit residue from forming, a photosensitive agent, a photoactive compound and solvent; electronics, relief images | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-05 | — | — | US | disclosed |
| US-7399572-B2 | Pretreatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-07-15 | — | — | US | disclosed |