SCHEMBL10001310

SCHEMBL10001310

CCCCCCCCCCCCc1cc(C)sc1-c1cc2c(s1)c1sc(-c3sc(C)cc3CCCCCCCCCCCC)cc1n2CCCCCCCC

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PKM P14618 1/20 0.33
▸ GPR35 Q9HC97 1/20 0.32
▸ ADRA2A P08913 1/20 0.31
▸ PSEN1 P49768 1/20 0.30
▸ PSEN2 P49810 1/20 0.30
▸ APH1B Q8WW43 1/20 0.30
▸ NCSTN Q92542 1/20 0.30
▸ APH1A Q96BI3 1/20 0.30
▸ PSENEN Q9NZ42 1/20 0.30
▸ TLR8 Q9NR97 2/20 0.30
▸ KDM4E B2RXH2 1/20 0.30
▸ ALDH1A1 P00352 1/20 0.30
▸ GAA P10253 1/20 0.30
▸ MEN1 O00255 1/20 0.30
▸ TP53 P04637 1/20 0.30
▸ CYP3A4 P08684 1/20 0.30
▸ ALOX5 P09917 1/20 0.30
▸ MAPT P10636 1/20 0.30
▸ TYR P14679 1/20 0.30
▸ ALOX15 P16050 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14015489 0.84 PKM (0.31) PKM
SCHEMBL15730456 0.82 PKM (0.36) PKM
SCHEMBL15730457 0.82 GPR35 (0.33) GPR35ADRA2APSEN1PSEN2APH1B
SCHEMBL18382249 0.81 PSEN1 (0.34) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL13558212 0.81 RORA (0.37) PKMKDM4EALDH1A1MAPTHTT
SCHEMBL13016849 0.80 GPR35 (0.37) GPR35MEN1TP53CYP3A4ALOX5
SCHEMBL10001315 0.80 GPR35 (0.37) GPR35MEN1TP53CYP3A4ALOX5
SCHEMBL13016853 0.80 GPR35 (0.37) GPR35MEN1TP53CYP3A4ALOX5
SCHEMBL14015469 0.79 ALDH1A1 (0.41) PKMPSEN1PSEN2APH1BNCSTN
SCHEMBL18371554 0.79 PSEN1 (0.33) PSEN1PSEN2APH1BNCSTNAPH1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150279504-A1 FILM FORMING COMPOSITION COMPRISING GRAPHENE MATERIAL AND CONDUCTING POLYMER SOLVAY (BE) 2015-10-01 — — US disclosed
US-9006725-B2 Dithienophthalimide semiconductor polymers BASF SE (DE) 2015-04-14 — — US disclosed
US-8759421-B2 Continuous process for preparing nanodispersions using an ultrasonic flow-through heat exchanger SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-06-24 — — US disclosed
US-20140142265-A1 DITHIENOPHTHALIMIDE SEMICONDUCTOR POLYMERS BASF (DE) 2014-05-22 — — US disclosed
US-20120049163-A1 Continuous Process For Preparing Nanodispersions Using An Ultrasonic Flow-Through Heat Exchanger XEROX CORPORATION (US) 2012-03-01 — — US disclosed
US-8030126-B2 Printing process for enhanced jetted performance of semiconductor layer XEROX CORPORATION (US) 2011-10-04 — — US disclosed
US-20110065232-A1 PRINTING PROCESS FOR ENHANCED JETTED PERFORMANCE OF SEMICONDUCTOR LAYER XEROX CORPORATION (US) 2011-03-17 — — US disclosed
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