SCHEMBL10001974

SCHEMBL10001974

Cc1ccc(Oc2ccc(C(=O)c3ccc(Oc4ccc(C)cc4)cc3)cc2)cc1

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.73
LMNA P02545 2/20 0.73
MMP13 P45452 2/20 0.66
SRD5A2 P31213 4/20 0.61
HPGD P15428 3/20 0.58
MAPT P10636 2/20 0.58
RAB9A P51151 1/20 0.58
CES2 O00748 1/20 0.52
CES1 P23141 1/20 0.52
KMT2A Q03164 1/20 0.52
PARP15 Q460N3 1/20 0.52
PARP14 Q460N5 1/20 0.52
PARP10 Q53GL7 1/20 0.52
PARP16 Q8N5Y8 1/20 0.52
PARP11 Q9NR21 1/20 0.52
PARP4 Q9UKK3 1/20 0.52
TEAD4 Q15561 1/20 0.52
SMN1; SMN2 Q16637 3/20 0.52
TSHR P16473 1/20 0.52
HTT P42858 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10084164 1.00 ALDH1A1 (0.73) ALDH1A1LMNAMMP13SRD5A2HPGD
SCHEMBL16997316 1.00 ALDH1A1 (0.73) ALDH1A1LMNAMMP13SRD5A2HPGD
SCHEMBL6384226 1.00 ALDH1A1 (0.73) ALDH1A1LMNAMMP13SRD5A2HPGD
SCHEMBL17049541 1.00 ALDH1A1 (0.73) ALDH1A1LMNAMMP13SRD5A2HPGD
SCHEMBL822866 1.00 ALDH1A1 (0.73) ALDH1A1LMNAMMP13SRD5A2HPGD
SCHEMBL24087885 1.00 ALDH1A1 (0.73) ALDH1A1LMNAMMP13SRD5A2HPGD
SCHEMBL822938 1.00 ALDH1A1 (0.73) ALDH1A1LMNAMMP13SRD5A2HPGD
SCHEMBL760051 0.94 ALDH1A1 (0.64) ALDH1A1LMNAMMP13SRD5A2HPGD
SCHEMBL11974584 0.94 ALDH1A1 (0.64) ALDH1A1LMNAMMP13SRD5A2HPGD
SCHEMBL14310920 0.92 LMNA (0.61) ALDH1A1LMNAMMP13SRD5A2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220291585-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE, PRODUCTION METHOD FOR CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE ASAHI KASEI KABUSHIKI KAISHA (JP) 2022-09-15 US disclosed
EP-4006073-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE, PRODUCTION METHOD FOR CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE Asahi Kasei Kabushiki Kaisha (JP) 2022-06-01 EP disclosed
US-11319410-B2 Precursor for polyimide and use thereof ETERNAL MATERIALS CO., LTD. (TW) 2022-05-03 US disclosed
WO-2021020463-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE, PRODUCTION METHOD FOR CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE 旭化成株式会社 2021-02-04 WO disclosed
US-10731004-B2 Polyimide precursor composition and use thereof ETERNAL MATERIALS CO., LTD. (TW) 2020-08-04 US disclosed
US-10696793-B2 Process for preparing polyimides ETERNAL MATERIALS CO., LTD. (TW) 2020-06-30 US disclosed
US-10639876-B2 Solvent-containing dry film and method for applying the same on a substrate ETERNAL MATERIALS CO., LTD. (TW) 2020-05-05 US disclosed
US-10626220-B2 Precursor for polyimide and use thereof ETERNAL MATERIALS CO., LTD. (TW) 2020-04-21 US disclosed
US-20200055986-A1 PROCESS FOR PREPARING POLYIMIDES ETERNAL MATERIALS CO., LTD. (TW) 2020-02-20 US disclosed
US-10280334-B2 Polyimides, coating composition formed therefrom and use thereof ETERNAL MATERIALS CO., LTD. (TW) 2019-05-07 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20100204412-A1 OLIGOMERS WITH DI-PHENYLETHYNYL ENDCAPS THE BOEING COMPANY 2010-08-12 US disclosed
US-20100204485-A1 POLYACETYLINIC OLIGOMERS THE BOEING COMPANY 2010-08-12 US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed
US-20090181324-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2009-07-16 US disclosed
US-20090181324-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2009-07-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100204485-A1 POLYACETYLINIC OLIGOMERS AADAC, ACMSD, ECPAS ALDH1A1 495/4885LMNA 998/4885MMP13 3879/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.