SCHEMBL10001978

SCHEMBL10001978

Cc1ccc(C(=O)Nc2cc(NC(=O)c3ccc(C)c(C)c3)cc(C(=O)O)c2)cc1C

nearest known ligand 0.63

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
FKBP5 Q13451 1/20 0.63
L3MBTL1 Q9Y468 2/20 0.62
PKM P14618 1/20 0.62
KMT2A Q03164 9/20 0.61
MEN1 O00255 7/20 0.61
POLB P06746 3/20 0.61
RAB9A P51151 3/20 0.58
NPC1 O15118 2/20 0.58
TDP1 Q9NUW8 3/20 0.56
MAPT P10636 2/20 0.56
LMNA P02545 2/20 0.56
NR1H4 Q96RI1 1/20 0.55
FABP1 P07148 1/20 0.55
P2RY14 Q15391 1/20 0.55
KCNQ3 O43525 1/20 0.55
KCNQ2 O43526 1/20 0.55
SMN1; SMN2 Q16637 1/20 0.54
GAA P10253 1/20 0.53
MCL1 Q07820 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1949548 0.91 FKBP5 (0.63) FKBP5KMT2AMEN1RAB9ANPC1
SCHEMBL30153426 0.91 FKBP5 (0.63) FKBP5KMT2AMEN1RAB9ANPC1
SCHEMBL14291460 0.88 KMT2A (0.69) FKBP5PKMKMT2AMEN1RAB9A
SCHEMBL13400969 0.86 THRB (0.64) FKBP5KMT2AMEN1RAB9ANPC1
SCHEMBL23070434 0.86 KMT2A (0.66) FKBP5L3MBTL1PKMKMT2AMEN1
SCHEMBL10325494 0.85 NPC1 (0.65) FKBP5KMT2AMEN1POLBRAB9A
SCHEMBL25815389 0.84 NPC1 (0.72) FKBP5KMT2AMEN1RAB9ANPC1
SCHEMBL16270607 0.83 P2RY14 (0.75) L3MBTL1PKMKMT2AMEN1POLB
SCHEMBL11955302 0.83 THRB (0.69) FKBP5KMT2AMEN1RAB9ANPC1
SCHEMBL2622770 0.83 KMT2A (0.76) FKBP5KMT2AMEN1POLBRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673540-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2014-03-18 US disclosed
US-8673540-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2014-03-18 US disclosed
US-20130095426-A1 PHOTOSENSITIVE POLYMIDES ETERNAL CHEMICAL CO., LTD. (TW) 2013-04-18 US disclosed
US-20130095426-A1 PHOTOSENSITIVE POLYMIDES ETERNAL CHEMICAL CO., LTD. (TW) 2013-04-18 US disclosed
US-8349539-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2013-01-08 US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 US disclosed