SCHEMBL10012239

SCHEMBL10012239

Nc1ccc(CC2CCCCC2)c(N)c1

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CEL P19835 1/20 0.42
NFE2L2 Q16236 1/20 0.41
FEN1 P39748 3/20 0.39
PNP P00491 1/20 0.35
CXCR4 P61073 1/20 0.35
RYR2 Q92736 1/20 0.35
ALOX5AP P20292 2/20 0.34
ALDH1A1 P00352 2/20 0.34
RAB9A P51151 2/20 0.34
DAO P14920 1/20 0.34
NPC1 O15118 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
AAK1 Q2M2I8 1/20 0.34
CASP1 P29466 1/20 0.33
RARB P10826 1/20 0.33
KDM4E B2RXH2 1/20 0.33
MAPT P10636 1/20 0.33
GFER P55789 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29973214 0.85 NFE2L2 (0.41) CELNFE2L2FEN1PNPALDH1A1
SCHEMBL23579165 0.85 NFE2L2 (0.41) CELNFE2L2FEN1PNPALDH1A1
SCHEMBL10703766 0.84 RYR2 (0.34) RYR2CASP1MAPT
SCHEMBL8247174 0.82 GBA1 (0.44) RYR2
SCHEMBL20963038 0.81 CEL (0.43) CELNFE2L2FEN1PNPDAO
SCHEMBL27772327 0.78 GAA (0.57) CELNFE2L2ALDH1A1KDM4EMAPT
SCHEMBL3574540 0.78 MTNR1A (0.44) RYR2ALDH1A1RAB9ANPC1SMN1; SMN2
SCHEMBL13632562 0.77 RYR2 (0.44) RYR2ALDH1A1SMN1; SMN2KDM4EMAPT
SCHEMBL8786337 0.77 KDM4E (0.43) CELFEN1PNPALDH1A1RAB9A
SCHEMBL20568006 0.77 KDM4E (0.43) CELFEN1PNPALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9268221-B2 Positive photosensitive resin composition, photosensitive resin layer prepared by using the same, and semiconductor device including the photosensitive resin layer CHEIL INDUSTRIES INC. (KR) 2016-02-23 US disclosed
CN-103135354-B Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL IND INC 2014-12-10 CN disclosed
US-8815489-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-08-26 US disclosed
CN-103135354-A Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL IND INC 2013-06-05 CN disclosed
US-20130137036-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2013-05-30 US disclosed
US-20120171609-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Layer Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Layer CHEIL INDUSTRIES INC. (KR) 2012-07-05 US disclosed
CN-102540724-A Positive photosensitive resin composition, a photosensitive resin layer prepared by using the same, and a semiconductor device including the photosensitive resin layer CHEIL IND INC 2012-07-04 CN disclosed