SCHEMBL100193

SCHEMBL100193

CC(S)CC(=O)OCCOC(=O)CC(C)S

nearest known ligand 0.38

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.37
ADRA2A P08913 1/20 0.34
ADRA1A P35348 1/20 0.34
MAPT P10636 2/20 0.33
BLM P54132 1/20 0.33
PRKCA P17252 1/20 0.33
NAAA Q02083 1/20 0.32
CYP2C19 P33261 1/20 0.32
MET P08581 1/20 0.32
L3MBTL1 Q9Y468 2/20 0.31
RNPEP Q9H4A4 1/20 0.31
MAPK1 P28482 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
ALDH1A1 P00352 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CYP19A1 P11511 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL607398 0.93 ALDH1A1 (0.35) DGKAADRA2AADRA1AMAPTBLM
SCHEMBL98140 0.93 ALDH1A1 (0.35) DGKAADRA2AADRA1AMAPTBLM
Cyclopropane SCHEMBL9933791 0.93 MAPT (0.38) DGKAADRA2AADRA1AMAPTBLM
SCHEMBL31132439 0.93 ALDH1A1 (0.35) DGKAADRA2AADRA1AMAPTBLM
SCHEMBL98110 0.91 NAAA (0.43) DGKAADRA2AADRA1AMAPTNAAA
SCHEMBL607473 0.91 NAAA (0.39) DGKAADRA2AADRA1AMAPTBLM
Propene SCHEMBL9933296 0.89 TSHR (0.35) DGKAPRKCAMETALDH1A1TDP1
SCHEMBL98429 0.89 NAAA (0.47) DGKAMAPTNAAAL3MBTL1MAPK1
SCHEMBL17226781 0.89 NAAA (0.38) DGKAMAPTNAAAL3MBTL1MAPK1
SCHEMBL97896 0.89 NAAA (0.47) DGKAMAPTNAAAL3MBTL1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 386 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4642651-A1 PHOSPHINE OXIDE-BASED PHOTOINITIATORS ARKEMA France (FR) 2025-11-05 EP claimed
WO-2024141190-A1 PHOSPHINE OXIDE-BASED PHOTOINITIATORS ARKEMA FRANCE (FR) 2024-07-04 WO claimed
CN-111752091-B Application of HABI mixed photoinitiator in UVLED photocuring 常州正洁智造科技有限公司 2022-09-06 CN claimed
US-20170343037-A1 Reclosable Adhesive Strip HENKEL AG & CO. KGAA (DE) 2017-11-30 US claimed
EP-3227397-A2 A RECLOSABLE ADHESIVE STRIP Henkel AG & Co. KGaA (DE) 2017-10-11 EP claimed
EP-2436715-B1 EPOXY RESIN-BASED COATING COMPOSITION SHOWA DENKO KK (JP) 2016-08-24 EP claimed
WO-2016087608-A2 A RECLOSABLE ADHESIVE STRIP HENKEL AG & CO. KGAA (DE) 2016-06-09 WO claimed
US-8865801-B2 Epoxy resin-based coating composition SHOWA DENKO K.K. (JP) 2014-10-21 US claimed
EP-1478668-B1 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO KK (JP) 2013-04-10 EP claimed
US-8242217-B2 Epoxy resin curing agent, process for preparing the same, and epoxy resin composition SHOWA DENKO K.K. (JP) 2012-08-14 US claimed
EP-2226347-B1 EPOXY RESIN CURING AGENT, METHOD FOR PRODUCING THE SAME, AND EPOXY RESIN COMPOSITION SHOWA DENKO KK (JP) 2012-06-27 EP claimed
US-20120077903-A1 EPOXY RESIN-BASED COATING COMPOSITION SHOWA DENKO K.K. (JP) 2012-03-29 US claimed
US-7989567-B2 Method for production of water/oil repellent composition and article ASAHI GLASS COMPANY, LIMITED (JP) 2011-08-02 US claimed
US-20100273940-A1 EPOXY RESIN CURING AGENT, PROCESS FOR PREPARING THE SAME, AND EPOXY RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2010-10-28 US claimed
EP-2226347-A1 EPOXY RESIN CURING AGENT, METHOD FOR PRODUCING THE SAME, AND EPOXY RESIN COMPOSITION Showa Denko K.K. (JP) 2010-09-08 EP claimed
US-7341828-B2 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2008-03-11 US claimed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US claimed
US-12637544-B2 UV curable silicone composition and cured product thereof DUROPTIX MATERIALS KABUSHIKI KAISHA (JP) 2026-05-26 US disclosed
US-20050258406-A1 Black resist composition for color filter SHOWA DENKO K.K. 2005-11-24 US disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637544-B2 UV curable silicone composition and cured product thereof QSOX1, MGMT, TST DGKA 3527/4885ADRA2A 2939/4885ADRA1A 2412/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.