⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685129 | 0.85 | — | — | |
| SCHEMBL10027355 | 0.84 | — | — | |
| SCHEMBL14286501 | 0.83 | — | — | |
| SCHEMBL12430039 | 0.82 | FKBP1A (0.31) | — | |
| SCHEMBL12998291 | 0.81 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL686102 | 0.79 | — | — | |
| SCHEMBL12140427 | 0.78 | — | — | |
| SCHEMBL685787 | 0.78 | ALDH1A1 (0.33) | — | |
| SCHEMBL10061834 | 0.77 | PAX8 (0.34) | — | |
| SCHEMBL112560 | 0.77 | FKBP1A (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2186838-B1 | METHOD FOR PRODUCING STAR POLYMER | NIPPON SODA CO (JP) | 2014-08-27 | — | — | EP | disclosed |
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-20110098413-A1 | Acrylic star polymer | NIPPON SODA CO., LTD (JP) | 2011-04-28 | — | — | US | disclosed |
| US-20110098413-A1 | Acrylic star polymer | NIPPON SODA CO., LTD (JP) | 2011-04-28 | — | — | US | disclosed |
| US-20110046333-A1 | ACRYLIC ACID-BASED POLYMER AND METHOD OF PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20110046333-A1 | ACRYLIC ACID-BASED POLYMER AND METHOD OF PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| US-7847045-B2 | Acrylic acid-based polymer and method of producing the same | NIPPON SODA CO., LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| EP-2186838-A1 | METHOD FOR PRODUCING STAR POLYMER | Nippon Soda Co., Ltd. (JP) | 2010-05-19 | — | — | EP | disclosed |
| US-20090209726-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090209726-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090111961-A1 | Acrylic Acid-Based Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-20090111961-A1 | Acrylic Acid-Based Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-7494759-B2 | Positive resist compositions and process for the formation of resist patterns with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-7494759-B2 | Positive resist compositions and process for the formation of resist patterns with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20070224538-A1 | Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224538-A1 | Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1752479-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2007-02-14 | — | — | EP | disclosed |